The influence of C-60 as intermediate on the diamond nucleation on copper substrate in HFCVD
文献类型:期刊论文
作者 | Li, C ; Feng, KC ; Fei, YJ ; Yuan, HT ; Xiong, Y ; Feng, K |
刊名 | APPLIED SURFACE SCIENCE
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出版日期 | 2003 |
卷号 | 207期号:1-4页码:169 |
关键词 | CHEMICAL-VAPOR-DEPOSITION POLYCRYSTALLINE DIAMOND GROWTH FILMS CU |
ISSN号 | 0169-4332 |
通讯作者 | Li, C (reprint author), Changchun Univ Sci & Technol, Dept Phys Opt, Changchun 130022, Peoples R China. |
中文摘要 | The diamond films on copper substrates using C-60 as intermediate have been grown by the hot filament chemical vapor deposition (HFCVD) technique. Scanning electron microscopy (SEM) and micro-Raman spectra were used to study the process of diamond nucleation. The UV-Iight pretreatment was beneficial for improving the diamond nucleation. The temperature of the substrate is very important. The C-60 molecule layers with UV-light pretreatment could increase the density of diamond nuclei on copper substrates and enhance the adherence between the copper substrates and diamond films. The long induction time for forming graphite intermediate is not necessary. (C) 2002 Elsevier Science B.V. All rights reserved. |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2013-09-23 |
源URL | [http://ir.iphy.ac.cn/handle/311004/45226] ![]() |
专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
推荐引用方式 GB/T 7714 | Li, C,Feng, KC,Fei, YJ,et al. The influence of C-60 as intermediate on the diamond nucleation on copper substrate in HFCVD[J]. APPLIED SURFACE SCIENCE,2003,207(1-4):169. |
APA | Li, C,Feng, KC,Fei, YJ,Yuan, HT,Xiong, Y,&Feng, K.(2003).The influence of C-60 as intermediate on the diamond nucleation on copper substrate in HFCVD.APPLIED SURFACE SCIENCE,207(1-4),169. |
MLA | Li, C,et al."The influence of C-60 as intermediate on the diamond nucleation on copper substrate in HFCVD".APPLIED SURFACE SCIENCE 207.1-4(2003):169. |
入库方式: OAI收割
来源:物理研究所
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