Thickness dependence of the surface plasmon dispersion in. ultrathin aluminum films on silicon
文献类型：期刊论文
| 作者 | Yu, YH ; Tang, Z ; Jiang, Y ; Wu, KH ; Wang, EG |
| 刊名 | SURFACE SCIENCE
 |
| 出版日期 | 2006 |
| 卷号 | 600期号:22页码:4966 |
| 关键词 | ELECTRON-ENERGY-LOSS METALS EXCITATIONS OVERLAYERS GROWTH SILVER |
| ISSN号 | 0039-6028 |
| 通讯作者 | Wu, KH (reprint author), Chinese Acad Sci, Inst Phys, State Key Lab Surface Phys, POB 603-20, Beijing 100080, Peoples R China. |
| 中文摘要 | The collective excitation in Al films deposited on Si(111)-7 x 7 surface was investigated by high-resolution electron-energy-loss spectroscopy (HREELS), X-ray photoelectron spectroscopy (XPS) and scanning tunneling microscopy (STM). At the Al film thickness d < 10 ML, the surface plasmon of Al film has only a small contribution to the observed energy-loss peaks in the long wavelength limit (q(parallel to) approximate to 0), while its contribution becomes significant for q(parallel to) > d(-1). More interestingly, for thin Al films, the initial slope of the surface plasmon dispersion curve is positive at q(parallel to) similar to 0, in a sharp contrast to bulk Al surface where the energy dispersion is negative. These observations may be explained based on the screening interaction of the space charge region at the Al-Si interface. (c) 2006 Elsevier B.V. All rights reserved. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2013-09-23 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/45826]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Yu, YH,Tang, Z,Jiang, Y,et al. Thickness dependence of the surface plasmon dispersion in. ultrathin aluminum films on silicon[J]. SURFACE SCIENCE,2006,600(22):4966. |
| APA | Yu, YH,Tang, Z,Jiang, Y,Wu, KH,&Wang, EG.(2006).Thickness dependence of the surface plasmon dispersion in. ultrathin aluminum films on silicon.SURFACE SCIENCE,600(22),4966. |
| MLA | Yu, YH,et al."Thickness dependence of the surface plasmon dispersion in. ultrathin aluminum films on silicon".SURFACE SCIENCE 600.22(2006):4966. |
入库方式： OAI收割
来源：物理研究所
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