Turbostratic boron carbonitride film and its field-emitting behavior
文献类型：期刊论文
| 作者 | Yu, J ; Wang, EG |
| 刊名 | APPLIED PHYSICS LETTERS
 |
| 出版日期 | 1999 |
| 卷号 | 74期号:20页码:2948 |
| ISSN号 | 0003-6951 |
| 关键词 | CHEMICAL-VAPOR-DEPOSITION ELECTRICAL-PROPERTIES THIN-FILMS EMISSION DIAMOND BC2N NITRIDE |
| 通讯作者 | Wang, EG (reprint author), Chinese Acad Sci, State Key Lab Surface Phys, Inst Phys, Beijing 100080, Peoples R China. |
| 中文摘要 | The turbostratic structure of boron carbonitride (BCN) films with various compositions synthesized by bias-assisted hot-filament chemical-vapor deposition was studied by x-ray diffraction and high-resolution transmission electron microscopy. Boron atoms can be incorporated into the turbostratic structure with a concentration up to 70%, and the interplanar spacing 3.49 Angstrom is independent of the film compositions in this range. Field-emission behavior of the BCN films is characterized. A low threshold electric field of 4 V/mu m and maximum emission current of 0.31 mA are obtained, which suggest a new candidate as a field-emitting material. (C) 1999 American Institute of Physics. [S0003-6951(99)03720-1]. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2013-09-23 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/46225]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Yu, J,Wang, EG. Turbostratic boron carbonitride film and its field-emitting behavior[J]. APPLIED PHYSICS LETTERS,1999,74(20):2948. |
| APA | Yu, J,&Wang, EG.(1999).Turbostratic boron carbonitride film and its field-emitting behavior.APPLIED PHYSICS LETTERS,74(20),2948. |
| MLA | Yu, J,et al."Turbostratic boron carbonitride film and its field-emitting behavior".APPLIED PHYSICS LETTERS 74.20(1999):2948. |
入库方式： OAI收割
来源：物理研究所
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