Turbostratic boron carbonitride films produced by bias-assisted hot filament chemical vapor deposition
文献类型：期刊论文
| 作者 | Yu, J ; Wang, EG ; Ahn, J ; Yoon, SF ; Zhang, Q ; Cui, J ; Yu, MB |
| 刊名 | JOURNAL OF APPLIED PHYSICS
 |
| 出版日期 | 2000 |
| 卷号 | 87期号:8页码:4022 |
| 关键词 | THIN-FILMS GRAPHITE NITRIDE SEMICONDUCTOR RAMAN BC2N |
| ISSN号 | 0021-8979 |
| 通讯作者 | Yu, J (reprint author), Nanyang Technol Univ, Ctr Microelect, Singapore 639798, Singapore. |
| 中文摘要 | Boron carbonitride (BCN) films with various compositions have been prepared by bias-assisted hot filament chemical vapor deposition. The three elements of B, C, and N are chemically bonded with each other and an atomic-level BCN hybrid has been formed in the films. The deposited films are composed of turbostratic structural regions ranging from a few to a few tens of nanometers. Besides, there exist some amorphous domains in the films. Boron atoms have been confirmed to be incorporated into the films with a concentration up to 70 at. %. The interplanar spacing of 3.49 A is found to be independent of the film composition in this range. These films show a blueshift in photoluminescence peak with increasing B content. These findings show that the electronic structure of BCN compounds can be controlled by changing compositions and the BCN compounds are blue-light emitting materials. (C) 2000 American Institute of Physics. [S0021-8979(00)02208-8]. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2013-09-23 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/46226]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Yu, J,Wang, EG,Ahn, J,et al. Turbostratic boron carbonitride films produced by bias-assisted hot filament chemical vapor deposition[J]. JOURNAL OF APPLIED PHYSICS,2000,87(8):4022. |
| APA | Yu, J.,Wang, EG.,Ahn, J.,Yoon, SF.,Zhang, Q.,...&Yu, MB.(2000).Turbostratic boron carbonitride films produced by bias-assisted hot filament chemical vapor deposition.JOURNAL OF APPLIED PHYSICS,87(8),4022. |
| MLA | Yu, J,et al."Turbostratic boron carbonitride films produced by bias-assisted hot filament chemical vapor deposition".JOURNAL OF APPLIED PHYSICS 87.8(2000):4022. |
入库方式： OAI收割
来源：物理研究所
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