XPS studies of chemical states of NiO/NiFe interface
文献类型：期刊论文
| 作者 | Yu, GH ; Chai, CL ; Zhu, FW ; Xiao, JM ; Lai, WY |
| 刊名 | JOURNAL OF UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING
 |
| 出版日期 | 2001 |
| 卷号 | 8期号:4页码:270 |
| 关键词 | EXCHANGE-ANISOTROPY THIN-FILMS NIO MODEL BIAS |
| ISSN号 | 1005-8850 |
| 通讯作者 | Yu, GH (reprint author), Univ Sci & Technol Beijing, Sch Mat Sci & Engn, Beijing 100083, Peoples R China. |
| 中文摘要 | Ta/NTiO/NiFe/Ta multilayers were prepared by radio frequency reactive and dc magnetron sputtering. The exchange coupling field between NiO and NiFe reached 9.6 x 10(3) A/m. The compositions and chemical states at the interface region of NiO/NiFe were studied using the X-ray photoelectron spectroscopy (XPS) and peak decomposition technique, The results show that there are two thermodynamically favorable reactions at NiO/NiFe interface: NiO+Fe = Ni + FeO and 3NiO+2Fe =3 Ni+Fe2O3. The thickness of the chemical reaction area estimated by angle-resolved XPS was about 1-1.5 nm. These interface reaction products appear magnetic defects, and the exchange coupling field H-ex and the coereivity H-c of NiO/NiFe are affected by these defects. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2013-09-23 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/46674]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Yu, GH,Chai, CL,Zhu, FW,et al. XPS studies of chemical states of NiO/NiFe interface[J]. JOURNAL OF UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING,2001,8(4):270. |
| APA | Yu, GH,Chai, CL,Zhu, FW,Xiao, JM,&Lai, WY.(2001).XPS studies of chemical states of NiO/NiFe interface.JOURNAL OF UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING,8(4),270. |
| MLA | Yu, GH,et al."XPS studies of chemical states of NiO/NiFe interface".JOURNAL OF UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING 8.4(2001):270. |
入库方式： OAI收割
来源：物理研究所
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