XRD and Raman study of vanadium oxide thin films deposited on fused silica substrates by RF magnetron sputtering
文献类型：期刊论文
| 作者 | Wang, XJ ; Li, HD ; Fei, YJ ; Wang, X ; Xiong, YY ; Nie, YX ; Feng, KA |
| 刊名 | APPLIED SURFACE SCIENCE
 |
| 出版日期 | 2001 |
| 卷号 | 177期号:1-2页码:8 |
| 关键词 | V6O13 MICROCRYSTALLINE SCATTERING SURFACE GROWTH VO2(B) |
| ISSN号 | 0169-4332 |
| 通讯作者 | Wang, XJ (reprint author), Chinese Acad Sci, Inst Phys, State Key Lab Surface Phys, POB 603, Beijing 100080, Peoples R China. |
| 中文摘要 | BaTiO3 thin films were epitaxially grown on SrTiO3 (001) and LaNiO3/SrTiO3 substrates by pulsed laser deposition under different oxygen pressures. The oxygen content in the BaTiO3 films was determined using modified Rutherford backscattering. The structural characteristics of the films were analysed by x-ray diffraction theta /2 theta scan, phi scan, and symmetric and asymmetric omega scans. The dielectric and ferroelectric properties of the films were measured by an impedance analyser and by a Sawyer-Tower circuit, respectively. It was found that the atomic ratio of O/Ba and Ti/Ba in the BaTiO3 films increases with oxygen pressure. The films fabricated in the intermediate oxygen pressure range of 2 to 10 Pa show the c-axis oriented tetragonal structure with a stoichiometry close to the ideal value. These films exhibit a relatively large dielectric constant, small dielectric loss and good ferroelectricity with a symmetric hysteresis loop. For growth at low oxygen pressure i.e. 0.1 Pa, the film with tetragonal c-axis orientation shows significant degradation in its dielectric properties. For a higher deposition oxygen pressure of 20 Pa, the film has tetragonal a-axis orientation and shows no ferroelectricity but has the largest dielectric constant. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2013-09-23 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/46728]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Wang, XJ,Li, HD,Fei, YJ,et al. XRD and Raman study of vanadium oxide thin films deposited on fused silica substrates by RF magnetron sputtering[J]. APPLIED SURFACE SCIENCE,2001,177(1-2):8. |
| APA | Wang, XJ.,Li, HD.,Fei, YJ.,Wang, X.,Xiong, YY.,...&Feng, KA.(2001).XRD and Raman study of vanadium oxide thin films deposited on fused silica substrates by RF magnetron sputtering.APPLIED SURFACE SCIENCE,177(1-2),8. |
| MLA | Wang, XJ,et al."XRD and Raman study of vanadium oxide thin films deposited on fused silica substrates by RF magnetron sputtering".APPLIED SURFACE SCIENCE 177.1-2(2001):8. |
入库方式： OAI收割
来源：物理研究所
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