Oblique-incidence optical reflectivity difference from a rough film of crystalline material
文献类型:期刊论文
作者 | Zhu, XD |
刊名 | PHYSICAL REVIEW B
![]() |
出版日期 | 2004 |
卷号 | 69期号:11 |
关键词 | ENERGY-ELECTRON-DIFFRACTION EPITAXIAL-GROWTH SURFACE SRTIO3 OSCILLATIONS HOMOEPITAXY REFLECTANCE ELLIPSOMETRY DEPENDENCE MBE |
ISSN号 | 1098-0121 |
通讯作者 | Zhu, XD (reprint author), Univ Calif Davis, Dept Phys, Davis, CA 95616 USA. |
中文摘要 | Formation of a rough film of crystalline material on a smooth substrate resulting from kinetic roughening in epitaxy or erosion causes disproportionate changes in reflectivity for s- and p-polarized light. I present a mean-field theory of optical reflectivity difference defined as (r(p)-r(p0))/r(p0)-(r(s)-r(s0))/r(s0)equivalent toDelta(p)-Delta(s) from such a rough film, with r(p0) and r(s0) being the reflectivities of the bare substrate, and r(p) and r(s) being the reflectivities after the rough film forms on the substrate. In the limit that the average film thickness is less than the optical wavelength lambda, I found that Delta(p)-Delta(s) consists of a term that varies linearly with the average film thickness and a term that is proportional to the surface density of step edge atoms. I apply such a theory to the analysis of growth and ion erosion of a number of crystalline materials studied with the oblique-incidence optical reflectivity difference (OI-RD) technique. |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2013-09-24 |
源URL | [http://ir.iphy.ac.cn/handle/311004/50118] ![]() |
专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
推荐引用方式 GB/T 7714 | Zhu, XD. Oblique-incidence optical reflectivity difference from a rough film of crystalline material[J]. PHYSICAL REVIEW B,2004,69(11). |
APA | Zhu, XD.(2004).Oblique-incidence optical reflectivity difference from a rough film of crystalline material.PHYSICAL REVIEW B,69(11). |
MLA | Zhu, XD."Oblique-incidence optical reflectivity difference from a rough film of crystalline material".PHYSICAL REVIEW B 69.11(2004). |
入库方式: OAI收割
来源:物理研究所
浏览0
下载0
收藏0
其他版本
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。