Preparation of CNx/TiNy multilayers by ion beam sputtering
文献类型：期刊论文
| 作者 | Yu, DL ; Tian, YJ ; He, JL ; Xiao, FR ; Wang, TS ; Li, DC ; Li, L ; Zheng, G ; Yanagisawa, O |
| 刊名 | JOURNAL OF CRYSTAL GROWTH
 |
| 出版日期 | 2001 |
| 卷号 | 233期号:1-2页码:303 |
| 关键词 | CARBON NITRIDE FILMS CYCLOTRON-RESONANCE PLASMA THIN-FILMS PHYSICAL-PROPERTIES CRYSTALLINE C3N4 DEPOSITION COATINGS |
| ISSN号 | 0022-0248 |
| 通讯作者 | Tian, YJ (reprint author), Yansham Univ, Coll Mat Sci & Chem Engn, No 438 Hebei St W, Hebei 066004, Peoples R China. |
| 中文摘要 | A new analyzing method for determination of the thickness variation during crystal growth based on the interference intensity variation of the Michelson inference image has been developed. With this relative simple method, the crystal growth rate can be measured in a higher accuracy than the conventional analyzing method. This method can also be used to determine the growth rate on very flat surfaces and to investigate the growth rate fluctuation, which is related to the unstable crystal growth. An application example on studying the in situ time-dependent crystal growth rate of Ba(NO3)(2) from aqueous solution has been given. (C) 2001 Published by Elsevier Science B.V. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2013-09-24 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/51321]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Yu, DL,Tian, YJ,He, JL,et al. Preparation of CNx/TiNy multilayers by ion beam sputtering[J]. JOURNAL OF CRYSTAL GROWTH,2001,233(1-2):303. |
| APA | Yu, DL.,Tian, YJ.,He, JL.,Xiao, FR.,Wang, TS.,...&Yanagisawa, O.(2001).Preparation of CNx/TiNy multilayers by ion beam sputtering.JOURNAL OF CRYSTAL GROWTH,233(1-2),303. |
| MLA | Yu, DL,et al."Preparation of CNx/TiNy multilayers by ion beam sputtering".JOURNAL OF CRYSTAL GROWTH 233.1-2(2001):303. |
入库方式： OAI收割
来源：物理研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。