中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Pressure effect on diamond nucleation in a hot-filament CVD system

文献类型:期刊论文

作者Lee, ST ; Lam, YW ; Lin, ZD ; Chen, Y ; Chen, QJ
刊名PHYSICAL REVIEW B
出版日期1997
卷号55期号:23页码:15937
关键词CHEMICAL-VAPOR-DEPOSITION MICROWAVE-PLASMA GROWTH FILMS SILICON
ISSN号0163-1829
通讯作者Lee, ST (reprint author), CITY UNIV HONG KONG,DEPT PHYS & MAT SCI,KOWLOON,HONG KONG.
中文摘要Using extraordinarily low pressure (0.1-1 Torr) we obtained high-density nucleation of diamond on mirror-polished silicon in a hot-filament chemical vapor deposition (HF-CVD) system. A diamond nuclei density as high as 10(10)-10(11) cm(-2) was achieved, which was comparable to the largest nuclei density obtained in a microwave-plasma chemical vapor deposition system. The low-pressure nucleation technique and the pressure effect on diamond nucleation were discussed in detail based on molecular dynamics. The enhanced nucleation at low pressure was attributed to an increased mean free path, which gave rise to an increased concentration of nucleating species at the substrate and other beneficial nucleating factors. The present work suggests that very low pressure may be an effective approach to nucleate and grow diamond films on untreated substrates via HF-CVD.
收录类别SCI
语种英语
公开日期2013-09-24
源URL[http://ir.iphy.ac.cn/handle/311004/51395]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式
GB/T 7714
Lee, ST,Lam, YW,Lin, ZD,et al. Pressure effect on diamond nucleation in a hot-filament CVD system[J]. PHYSICAL REVIEW B,1997,55(23):15937.
APA Lee, ST,Lam, YW,Lin, ZD,Chen, Y,&Chen, QJ.(1997).Pressure effect on diamond nucleation in a hot-filament CVD system.PHYSICAL REVIEW B,55(23),15937.
MLA Lee, ST,et al."Pressure effect on diamond nucleation in a hot-filament CVD system".PHYSICAL REVIEW B 55.23(1997):15937.

入库方式: OAI收割

来源:物理研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。