Pulsed ion sheath dynamics in a cylindrical bore for inner surface grid-enhanced plasma source ion implantation
文献类型:期刊论文
作者 | Wang, JL ; Zhang, GL ; Fan, SH ; Yang, WB ; Yang, SZ |
刊名 | CHINESE PHYSICS LETTERS
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出版日期 | 2002 |
卷号 | 19期号:10页码:1473 |
关键词 | AUXILIARY ELECTRODE MAGNETIC RECONNECTION MODEL |
ISSN号 | 0256-307X |
通讯作者 | Wang, JL (reprint author), Chinese Acad Sci, Inst Phys, Beijing 100080, Peoples R China. |
中文摘要 | Based on our recently proposed grid-enhanced plasma source ion implantation (GEPSII) technique for inner surface modification of materials with cylindrical geometry, we present the corresponding theoretical studies of the temporal evolution of the plasma ion sheath between the grid electrode and the target in a cylindrical bore. Typical results such as the ion sheath evolution, time-dependent ion density and time-integrated ion energy distribution at the target are calculated by solving Poisson's equation coupled with fluid equations for collisionless ions and Boltzmann assumption for electrons using finite difference methods. The calculated results can further verify the feasibility and superiority of this new technique. |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2013-09-24 |
源URL | [http://ir.iphy.ac.cn/handle/311004/51594] ![]() |
专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
推荐引用方式 GB/T 7714 | Wang, JL,Zhang, GL,Fan, SH,et al. Pulsed ion sheath dynamics in a cylindrical bore for inner surface grid-enhanced plasma source ion implantation[J]. CHINESE PHYSICS LETTERS,2002,19(10):1473. |
APA | Wang, JL,Zhang, GL,Fan, SH,Yang, WB,&Yang, SZ.(2002).Pulsed ion sheath dynamics in a cylindrical bore for inner surface grid-enhanced plasma source ion implantation.CHINESE PHYSICS LETTERS,19(10),1473. |
MLA | Wang, JL,et al."Pulsed ion sheath dynamics in a cylindrical bore for inner surface grid-enhanced plasma source ion implantation".CHINESE PHYSICS LETTERS 19.10(2002):1473. |
入库方式: OAI收割
来源:物理研究所
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