Quantitative microscopy of nonlinear dielectric constant using a scanning evanescent microwave microscopy
文献类型：期刊论文
| 作者 | Hu, B ; Liu, WH ; Gao, C ; Zhu, XH ; Zheng, DN |
| 刊名 | APPLIED PHYSICS LETTERS
 |
| 出版日期 | 2006 |
| 卷号 | 89期号:4 |
| 关键词 | NEAR-FIELD MICROSCOPY FERROELECTRIC DOMAINS THIN-FILMS |
| ISSN号 | 0003-6951 |
| 通讯作者 | Gao, C (reprint author), Univ Sci & Technol China, Natl Synchrotron Radiat Lab, Hefei 230026, Anhui, Peoples R China. |
| 中文摘要 | Quantitative characterization of dielectric nonlinearity in ferroelectric materials has been successfully performed using a scanning evanescent microwave microscope, and a key calibration coefficient for quantitative microscopy of nonlinear dielectric constant is derived. This unique technique has advantages of high spatial resolution and simultaneously accessing of other related properties such as dielectric constant and magnetoelectric coefficient. Samples of LiNbO3 single crystal and PbTiO3 thin film are measured, which demonstrates that this technique can access the nonlinear dielectric constant of a microregion with a sensitivity of 1.0x10(-21) F/V. (c) 2006 American Institute of Physics. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2013-09-24 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/51628]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Hu, B,Liu, WH,Gao, C,et al. Quantitative microscopy of nonlinear dielectric constant using a scanning evanescent microwave microscopy[J]. APPLIED PHYSICS LETTERS,2006,89(4). |
| APA | Hu, B,Liu, WH,Gao, C,Zhu, XH,&Zheng, DN.(2006).Quantitative microscopy of nonlinear dielectric constant using a scanning evanescent microwave microscopy.APPLIED PHYSICS LETTERS,89(4). |
| MLA | Hu, B,et al."Quantitative microscopy of nonlinear dielectric constant using a scanning evanescent microwave microscopy".APPLIED PHYSICS LETTERS 89.4(2006). |
入库方式： OAI收割
来源：物理研究所
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