Residual strain around a step edge of artificial Al/Si(111)-7x7 nanocluster
文献类型：期刊论文
| 作者 | Liu, ZW ; Xie, HM ; Fang, DN ; Dai, FL ; Xue, QK ; Liu, H ; Jia, JF |
| 刊名 | APPLIED PHYSICS LETTERS
 |
| 出版日期 | 2005 |
| 卷号 | 87期号:20 |
| 关键词 | SURFACES DISPLACEMENT SI(111)-7X7 MICROSCOPY ENERGIES SILICON SI(001) ARRAYS |
| ISSN号 | 0003-6951 |
| 通讯作者 | Liu, ZW (reprint author), Beijing Inst Technol, Sch Sci, Dept Mech, Beijing 100081, Peoples R China. |
| 中文摘要 | During artificial Al/Si(111)-7x7 nanocluster fabrication by using surface-mediated clustering, original step with an atomically straight edge becomes curved and irregular because of stronger attractive interaction between Al atoms and Si atoms. Surface residual strain around step edges has been studied by using digital geometric phase technique. The results show that the residual strain is compressive and there is larger compressive stress near both of the up and down step edges. (C) 2005 American Institute of Physics. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2013-09-24 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/52092]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Liu, ZW,Xie, HM,Fang, DN,et al. Residual strain around a step edge of artificial Al/Si(111)-7x7 nanocluster[J]. APPLIED PHYSICS LETTERS,2005,87(20). |
| APA | Liu, ZW.,Xie, HM.,Fang, DN.,Dai, FL.,Xue, QK.,...&Jia, JF.(2005).Residual strain around a step edge of artificial Al/Si(111)-7x7 nanocluster.APPLIED PHYSICS LETTERS,87(20). |
| MLA | Liu, ZW,et al."Residual strain around a step edge of artificial Al/Si(111)-7x7 nanocluster".APPLIED PHYSICS LETTERS 87.20(2005). |
入库方式： OAI收割
来源：物理研究所
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