中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Role of gallium wetting layer in high-quality ZnO growth on sapphire(0001) substrates

文献类型:期刊论文

作者Zeng, ZQ ; Wang, Y ; Du, XL ; Mei, ZX ; Kong, XH ; Jia, JF ; Xue, QK ; Zhang, Z
刊名SCIENCE IN CHINA SERIES G-PHYSICS MECHANICS & ASTRONOMY
出版日期2004
卷号47期号:5页码:612
关键词MOLECULAR-BEAM EPITAXY ALPHA-AL2O3(0001) SURFACE POLARITY DEPENDENCE GAN FILMS TERMINATION
ISSN号1672-1799
通讯作者Zeng, ZQ (reprint author), Chinese Acad Sci, State Key Lab Surface Phys, Inst Phys, Beijing 100080, Peoples R China.
中文摘要A Ga wetting layer was used to modify the surface structure of sapphire (0001) substrate to prepare high-quality ZnO film by radio frequency plasma-assisted molecule beam epitaxy. We found that this Ga layer plays a crucial role in eliminating 30degrees rotation domains, controlling polarity and decreasing defect density in ZnO epilayers, as demonstrated by in situ reflection high energy electron diffraction, ex situ high resolution X-ray diffraction and high resolution cross-sectional transmission electron microscopy. Zn-polar film of ZnO was determined by convergent beam electron diffraction. A Ga bilayer model is proposed to understand the effects of the Ga wetting layer on high-quality ZnO growth.
收录类别SCI
语种英语
公开日期2013-09-24
源URL[http://ir.iphy.ac.cn/handle/311004/52225]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式
GB/T 7714
Zeng, ZQ,Wang, Y,Du, XL,et al. Role of gallium wetting layer in high-quality ZnO growth on sapphire(0001) substrates[J]. SCIENCE IN CHINA SERIES G-PHYSICS MECHANICS & ASTRONOMY,2004,47(5):612.
APA Zeng, ZQ.,Wang, Y.,Du, XL.,Mei, ZX.,Kong, XH.,...&Zhang, Z.(2004).Role of gallium wetting layer in high-quality ZnO growth on sapphire(0001) substrates.SCIENCE IN CHINA SERIES G-PHYSICS MECHANICS & ASTRONOMY,47(5),612.
MLA Zeng, ZQ,et al."Role of gallium wetting layer in high-quality ZnO growth on sapphire(0001) substrates".SCIENCE IN CHINA SERIES G-PHYSICS MECHANICS & ASTRONOMY 47.5(2004):612.

入库方式: OAI收割

来源:物理研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。