Sensitivity of Ag/Al interface specific resistances to interfacial intermixing
文献类型：期刊论文
| 作者 | Sharma, A ; Theodoropoulou, N ; Wang, SA ; Xia, K ; Pratt, WP ; Bass, J |
| 刊名 | JOURNAL OF APPLIED PHYSICS
 |
| 出版日期 | 2009 |
| 卷号 | 105期号:12 |
| 关键词 | MULTILAYERS |
| ISSN号 | 0021-8979 |
| 通讯作者 | Sharma, A (reprint author), Michigan State Univ, Dept Phys, E Lansing, MI 48824 USA. |
| 中文摘要 | We have measured a Ag/Al interface specific resistance, 2AR(Ag/Al)(111) = 1.4 f Omega m(2), that is twice that predicted for a perfect interface, 50% larger than for a 2 ML 50%-50% alloy, and even larger than our newly predicted 1.3 f Omega m(2) for a 4 ML 50%-50% alloy. Such a large value of 2AR(Ag/Al)(111) confirms a predicted sensitivity to interfacial disorder and suggests an interface >= 4 ML thick. From our calculations, a predicted anisotropy ratio, 2AR(Ag/Al)(001)/2AR(Ag/Al) (111), of more than 4 for a perfect interface should be reduced to less than 2 for a 4 ML interface, making it harder to detect any such anisotropy. (c) 2009 American Institute of Physics. [DOI: 10.1063/1.3155856] |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2013-09-24 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/52483]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Sharma, A,Theodoropoulou, N,Wang, SA,et al. Sensitivity of Ag/Al interface specific resistances to interfacial intermixing[J]. JOURNAL OF APPLIED PHYSICS,2009,105(12). |
| APA | Sharma, A,Theodoropoulou, N,Wang, SA,Xia, K,Pratt, WP,&Bass, J.(2009).Sensitivity of Ag/Al interface specific resistances to interfacial intermixing.JOURNAL OF APPLIED PHYSICS,105(12). |
| MLA | Sharma, A,et al."Sensitivity of Ag/Al interface specific resistances to interfacial intermixing".JOURNAL OF APPLIED PHYSICS 105.12(2009). |
入库方式： OAI收割
来源：物理研究所
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