Shadow effect and its revisal in grid-enhanced plasma source with ion implantation method
文献类型：期刊论文
| 作者 | Zhang, GL ; Wang, JL ; Liu, YF ; Li, XM ; Wu, XF ; Fan, SH ; Liu, CZ ; Yang, SZ |
| 刊名 | CHINESE PHYSICS LETTERS
 |
| 出版日期 | 2004 |
| 卷号 | 21期号:6页码:1114 |
| 关键词 | INNER SURFACE MODIFICATION TUBES |
| ISSN号 | 0256-307X |
| 通讯作者 | Zhang, GL (reprint author), Chinese Acad Sci, Inst Phys, POB 603, Beijing 100080, Peoples R China. |
| 中文摘要 | The implanting voltage, gas pressure and the grid electrode radius are the key parameters influencing the surface grid shadow effect that has been observed in our grid-enhanced plasma source ion implantation experiment. To reduce the shadow effect and obtain a corresponding better implantation uniformity of sample surfaces, we need to use lower implanting voltage, higher gas pressure and smaller grid radius. Furthermore, we apply an axial magnetic field to increase the plasma density inside the tube and to mix the plasma outside the grid, so that the shadow effect of sample surfaces can be weakened. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2013-09-24 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/52496]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Zhang, GL,Wang, JL,Liu, YF,et al. Shadow effect and its revisal in grid-enhanced plasma source with ion implantation method[J]. CHINESE PHYSICS LETTERS,2004,21(6):1114. |
| APA | Zhang, GL.,Wang, JL.,Liu, YF.,Li, XM.,Wu, XF.,...&Yang, SZ.(2004).Shadow effect and its revisal in grid-enhanced plasma source with ion implantation method.CHINESE PHYSICS LETTERS,21(6),1114. |
| MLA | Zhang, GL,et al."Shadow effect and its revisal in grid-enhanced plasma source with ion implantation method".CHINESE PHYSICS LETTERS 21.6(2004):1114. |
入库方式： OAI收割
来源：物理研究所
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