中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Si diffusion path for pit-free graphene growth on SiC(0001)

文献类型:期刊论文

作者Zhu, CX ; Xu, ZG ; Huo, ZL ; Yang, R ; Zheng, ZW ; Cui, YX ; Liu, J ; Wang, YM ; Shi, DX ; Zhang, GY ; Li, FH ; Liu, M
刊名PHYSICAL REVIEW B
出版日期2011
卷号84期号:19
关键词SELF-DIFFUSION EPITAXIAL GRAPHENE SINGLE-CRYSTALS RECONSTRUCTION SI-30
ISSN号1098-0121
通讯作者Sun, GF (reprint author), Univ Wisconsin, Dept Phys, Milwaukee, WI 53211 USA.
中文摘要Density functional theory calculations reveal that the interfacial 6 root 3 x 6 root 3 structure [awarped graphene layer with periodic inclusions of pentagon-hexagon-heptagon (H(5,6,7)) defects] facilitates a Si diffusion path vertically through the interface layer during epitaxial growth of graphene on SiC(0001). The calculated diffusion barrier is 4.7 eV, competitive with Si interstitial diffusion of similar to 3.5 eV in SiC [M. Bockstedte et al., Phys. Rev. B 68, 205201 (2003)]. Scanning tunneling microscopy study shows that, for growth in an Ar background, where Si desorption is suppressed and all diffusion channels contribute, graphene films with reduced pit density can be grown on nominally flat SiC substrates. On the other hand, for Si diffusion-limited growth in ultrahigh vacuum, the Si interstitial diffusion is the energetically favorable path where the step edges serve as the necessary outlet toward Si desorption. The much higher density of step edges on vicinal substrates also facilitates the growth of pit-free graphene.
收录类别SCI
资助信息DOE [DE-FG02-07ER46228]; NSFC; MOST
语种英语
公开日期2013-09-24
源URL[http://ir.iphy.ac.cn/handle/311004/52523]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式
GB/T 7714
Zhu, CX,Xu, ZG,Huo, ZL,et al. Si diffusion path for pit-free graphene growth on SiC(0001)[J]. PHYSICAL REVIEW B,2011,84(19).
APA Zhu, CX.,Xu, ZG.,Huo, ZL.,Yang, R.,Zheng, ZW.,...&Liu, M.(2011).Si diffusion path for pit-free graphene growth on SiC(0001).PHYSICAL REVIEW B,84(19).
MLA Zhu, CX,et al."Si diffusion path for pit-free graphene growth on SiC(0001)".PHYSICAL REVIEW B 84.19(2011).

入库方式: OAI收割

来源:物理研究所

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