Step-by-step cooling of a two-dimensional Na gas on the Si(111)-(7 x 7) surface
文献类型:期刊论文
作者 | Wu, KH ; Oreshkin, AI ; Takamura, Y ; Fujikawa, Y ; Nagao, T ; Briere, T ; Kumar, V ; Kawazoe, Y ; Dou, RF ; Jia, JF ; Xue, QK ; Sakurai, T |
刊名 | PHYSICAL REVIEW B
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出版日期 | 2004 |
卷号 | 70期号:19 |
关键词 | SCANNING-TUNNELING-MICROSCOPY SINGLE ATOMS |
ISSN号 | 1098-0121 |
通讯作者 | Wu, KH (reprint author), Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan. |
中文摘要 | We report a temperature-dependent scanning tunneling microscopy study of Na adsorption on the Si(111)-(7x7) surface by cooling the surface from room temperature to 80 K. While at room temperature Na atoms can diffuse freely on the surface to form a two-dimensional gas, their motion is confined within the 7x7 half-unit cells at 160 K. With further cooling to 80 K, Na atoms become localized within individual "basins." The estimated diffusion barriers of Na atoms on the Si(111)-(7x7) surface and nature of interaction among them agree well with our theoretical predictions. |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2013-09-24 |
源URL | [http://ir.iphy.ac.cn/handle/311004/53067] ![]() |
专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
推荐引用方式 GB/T 7714 | Wu, KH,Oreshkin, AI,Takamura, Y,et al. Step-by-step cooling of a two-dimensional Na gas on the Si(111)-(7 x 7) surface[J]. PHYSICAL REVIEW B,2004,70(19). |
APA | Wu, KH.,Oreshkin, AI.,Takamura, Y.,Fujikawa, Y.,Nagao, T.,...&Sakurai, T.(2004).Step-by-step cooling of a two-dimensional Na gas on the Si(111)-(7 x 7) surface.PHYSICAL REVIEW B,70(19). |
MLA | Wu, KH,et al."Step-by-step cooling of a two-dimensional Na gas on the Si(111)-(7 x 7) surface".PHYSICAL REVIEW B 70.19(2004). |
入库方式: OAI收割
来源:物理研究所
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