Structure studies of C3N4 thin films prepared by microwave plasma chemical vapour deposition
文献类型：期刊论文
| 作者 | Zhang, YP ; Gao, HJ ; Gu, YS |
| 刊名 | JOURNAL OF PHYSICS D-APPLIED PHYSICS
 |
| 出版日期 | 2001 |
| 卷号 | 34期号:3页码:299 |
| 关键词 | CRYSTALLINE C3N4 MPCVD |
| ISSN号 | 0022-3727 |
| 通讯作者 | Zhang, YP (reprint author), Chinese Acad Sci, Inst Phys, Ctr Condensed Matter Phys, Beijing Lab Vacuum Phys, POB 2724, Beijing 100080, Peoples R China. |
| 中文摘要 | Crystalline carbon nitride films have been synthesized on Si(100) substrates by a microwave plasma chemical vapour deposition technique, using a gas mixture containing nitrogen and methane at various ratios as precursors. Scanning electron microscopy shows that the films consisted of hexagonal crystalline rods, which are about 1-2 mum long and about 0.4 mum wide. X-ray diffraction and transition electron microscopy indicate that the films are mainly composed of alpha- and beta -C3N4, and these results match more closely with the alpha -C3N4 than with the beta -C3N4 phase. Fourier transform infrared absorption spectra of carbon nitride films support the existence of alpha- and beta -C3N4. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2013-09-24 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/53609]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Zhang, YP,Gao, HJ,Gu, YS. Structure studies of C3N4 thin films prepared by microwave plasma chemical vapour deposition[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS,2001,34(3):299. |
| APA | Zhang, YP,Gao, HJ,&Gu, YS.(2001).Structure studies of C3N4 thin films prepared by microwave plasma chemical vapour deposition.JOURNAL OF PHYSICS D-APPLIED PHYSICS,34(3),299. |
| MLA | Zhang, YP,et al."Structure studies of C3N4 thin films prepared by microwave plasma chemical vapour deposition".JOURNAL OF PHYSICS D-APPLIED PHYSICS 34.3(2001):299. |
入库方式： OAI收割
来源：物理研究所
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