Study on the microstructure and properties of (Ti, Al) N film deposited by pulsed high energy density plasma
文献类型：期刊论文
| 作者 | Liu, YF ; Han, JM ; Zhang, GL ; Wang, JL ; Chen, GL ; Li, XM ; Feng, WR ; Fan, SH ; Liu, CZ ; Yang, SZ |
| 刊名 | ACTA PHYSICA SINICA
 |
| 出版日期 | 2005 |
| 卷号 | 54期号:3页码:1301 |
| 关键词 | ROOM-TEMPERATURE NITRIDE FILMS COATINGS STEEL |
| ISSN号 | 1000-3290 |
| 通讯作者 | Liu, YF (reprint author), Beijing Jiaotong Univ, Sch Mech Elect & Control Engn, Beijing 100044, Peoples R China. |
| 中文摘要 | Hard and corrosion resistance (Ti, Al) N film was deposited by pulsed high energy density plasma on the substrate of 0.45% C carbon steel at ambient temperature. The microstructure of the film has been investigated by SEM, XRD, XPS and AES. The nanohardness of the film was tested by nanoindentation tester. The corrosion resistance of the film was tested by potentiodynamic polarization in 0.5 mol /L H2SO4, aqueous solution. The results indicate that the film mainly composed of (Ti, ON and a small amount of Al)N. The nanohardness of the film approaches 26 GPa. The corrosion resistance of the film is improved by about one order of magnitude, compared with 1Cr18Ni9Ti austenitic stainless steel. |
| 收录类别 | SCI |
| 语种 | 中文 |
| 公开日期 | 2013-09-24 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/53864]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Liu, YF,Han, JM,Zhang, GL,et al. Study on the microstructure and properties of (Ti, Al) N film deposited by pulsed high energy density plasma[J]. ACTA PHYSICA SINICA,2005,54(3):1301. |
| APA | Liu, YF.,Han, JM.,Zhang, GL.,Wang, JL.,Chen, GL.,...&Yang, SZ.(2005).Study on the microstructure and properties of (Ti, Al) N film deposited by pulsed high energy density plasma.ACTA PHYSICA SINICA,54(3),1301. |
| MLA | Liu, YF,et al."Study on the microstructure and properties of (Ti, Al) N film deposited by pulsed high energy density plasma".ACTA PHYSICA SINICA 54.3(2005):1301. |
入库方式： OAI收割
来源：物理研究所
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