中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Synthesis and physicochemical properties of nanocrystalline silicon carbonitride films deposited by microwave plasma from organoelement compounds

文献类型:期刊论文

作者Fainer, NI ; Kosinova, ML ; Rumyantsev, YM ; Maksimovskii, EA ; Kuznetsov, FA ; Kesler, VG ; Kirienko, VV ; Han, BS ; Lu, C
刊名GLASS PHYSICS AND CHEMISTRY
出版日期2005
卷号31期号:4页码:427
关键词THIN-FILMS NITRIDE
ISSN号1087-6596
通讯作者Fainer, NI (reprint author), Russian Acad Sci, Inst Inorgan Chem, Siberian Div, Pr Akademika Lavrenteva 3, Novosibirsk 630090, Russia.
中文摘要Nanocrystalline films of a ternary compound, namely, silicon carbonitride SiCxNy, are prepared by plasma-enhanced chemical vapor deposition at temperatures of 473-1173 K with the use of a complex gaseous mixture of hexamethyldisilazane Si2NH(CH3)(6), ammonia, and helium. The chemical and phase compositions and the physicochemical properties of the films are investigated using IR, Auger electron, and X-ray photoelectron spectroscopy; ellipsometry; synchrotron X-ray powder diffraction; electron and atomic-force microscopy; microhardness measurements with a nanoindenter; and electrical measurements. Correlations of the composition of the initial gas phase and the synthesis temperature with a number of functional properties of the SiCxNy silicon carbonitride films are revealed.
收录类别SCI
语种英语
公开日期2013-09-24
源URL[http://ir.iphy.ac.cn/handle/311004/54383]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式
GB/T 7714
Fainer, NI,Kosinova, ML,Rumyantsev, YM,et al. Synthesis and physicochemical properties of nanocrystalline silicon carbonitride films deposited by microwave plasma from organoelement compounds[J]. GLASS PHYSICS AND CHEMISTRY,2005,31(4):427.
APA Fainer, NI.,Kosinova, ML.,Rumyantsev, YM.,Maksimovskii, EA.,Kuznetsov, FA.,...&Lu, C.(2005).Synthesis and physicochemical properties of nanocrystalline silicon carbonitride films deposited by microwave plasma from organoelement compounds.GLASS PHYSICS AND CHEMISTRY,31(4),427.
MLA Fainer, NI,et al."Synthesis and physicochemical properties of nanocrystalline silicon carbonitride films deposited by microwave plasma from organoelement compounds".GLASS PHYSICS AND CHEMISTRY 31.4(2005):427.

入库方式: OAI收割

来源:物理研究所

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