中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
A comparison of the field emission characteristics of vertically aligned graphene sheets grown on different SiC substrates

文献类型:期刊论文

作者Chen, LL ; Guo, LW ; Liu, Y ; Li, ZL ; Huang, J ; Lu, W
刊名CHINESE PHYSICS B
出版日期2013
卷号22期号:10
关键词field emission vertically aligned graphene sheets SiC substrate
ISSN号1674-1056
通讯作者Guo, LW (reprint author), Chinese Acad Sci, Inst Phys, Beijing Natl Lab Condensed Matter Phys, Res & Dev Ctr Funct Crystals, Beijing 100190, Peoples R China.
中文摘要The field emission (FE) properties of vertically aligned graphene sheets (VAGSs) grown on different SiC substrates are reported. The VAGSs grown on nonpolar SiC (10-10) substrate show an ordered alignment with the graphene basal plane-parallel to each other, and show better FE features, with a lower turn-on field and a larger field enhancement factor. The VAGSs grown on polar SiC (000-1) substrate reveal a random petaloid-shaped arrangement and stable current emission over 8 hours with a maximum emission current fluctuation of only 4%. The reasons behind the differing FE characteristics of the VAGSs on different SiC substrates are analyzed and discussed.
资助信息National Key Basic Research Program of China [2011CB932700]; National Natural Science Foundation of China [51272279, 51072223, 50972162]
语种英语
公开日期2014-01-16
源URL[http://ir.iphy.ac.cn/handle/311004/56711]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式
GB/T 7714
Chen, LL,Guo, LW,Liu, Y,et al. A comparison of the field emission characteristics of vertically aligned graphene sheets grown on different SiC substrates[J]. CHINESE PHYSICS B,2013,22(10).
APA Chen, LL,Guo, LW,Liu, Y,Li, ZL,Huang, J,&Lu, W.(2013).A comparison of the field emission characteristics of vertically aligned graphene sheets grown on different SiC substrates.CHINESE PHYSICS B,22(10).
MLA Chen, LL,et al."A comparison of the field emission characteristics of vertically aligned graphene sheets grown on different SiC substrates".CHINESE PHYSICS B 22.10(2013).

入库方式: OAI收割

来源:物理研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。