Effect of pulsed bias on the properties of ZrN/TiZrN films deposited by a cathodic vacuum arc
文献类型：期刊论文
| 作者 | Zhang, GP ; Wang, XQ ; Lu, GH ; Zhou, L ; Huang, J ; Chen, W ; Yang, SZ |
| 刊名 | CHINESE PHYSICS B
 |
| 出版日期 | 2013 |
| 卷号 | 22期号:3 |
| 关键词 | physical vapor deposition TiZrN films pulsed bias cathodic vacuum arc |
| ISSN号 | 1674-1056 |
| 通讯作者 | Yang, SZ (reprint author), Chinese Acad Sci, Inst Phys, Beijing 100190, Peoples R China. |
| 中文摘要 | ZrN/TiZrN multilayers are deposited by using the cathodic vacuum arc method with different substrate bias (from 0 to -800 V), using Ti and Zr plasma flows in residual N-2 atmosphere, combined with ion bombardment of sample surfaces. The effect of pulsed bias on the structure and properties of films is investigated. Microstructure of the coating is analyzed by X-ray diffraction (XRD), and scanning electron microscopy (SEM). In addition, nanohardness, Young's modulus, and scratch tests are performed. The experimental results show that the films exhibit a nanoscale multilayer structure consisting of TiZrN and ZrN phases. Solid solutions are formed for component TiZrN films. The dominant preferred orientation of TiZrN films is (111) and (220). At a pulsed bias of -200 V, the nanohardness and the adhesion strength of the ZrN/TiZrN multilayer reach a maximum of 38 GPa, and 78 N, respectively. The ZrN/TiZrN multilayer demonstrates an enhanced nanohardness compared with binary TiN and ZrN films deposited under equivalent conditions. |
| 资助信息 | National Magnetic Confinement Fusion Science Program of China [2009GB106004] |
| 语种 | 英语 |
| 公开日期 | 2014-01-16 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/56923]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Zhang, GP,Wang, XQ,Lu, GH,et al. Effect of pulsed bias on the properties of ZrN/TiZrN films deposited by a cathodic vacuum arc[J]. CHINESE PHYSICS B,2013,22(3). |
| APA | Zhang, GP.,Wang, XQ.,Lu, GH.,Zhou, L.,Huang, J.,...&Yang, SZ.(2013).Effect of pulsed bias on the properties of ZrN/TiZrN films deposited by a cathodic vacuum arc.CHINESE PHYSICS B,22(3). |
| MLA | Zhang, GP,et al."Effect of pulsed bias on the properties of ZrN/TiZrN films deposited by a cathodic vacuum arc".CHINESE PHYSICS B 22.3(2013). |
入库方式： OAI收割
来源：物理研究所
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