中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Improvement of the thermal design in the SiC PVT growth process

文献类型:期刊论文

作者Yan JY(颜君毅); Chen QS(陈启生); Jiang YN(姜燕妮); Zhang H
刊名Journal of Crystal Growth
出版日期2014
卷号385页码:34-37
通讯作者邮箱qschen@imech.ac.cn
关键词Fluid flows Mass transfer Growth from vapor Semiconducting silicon compounds
ISSN号0022-0248
产权排序[Yan, J-Y; Chen, Q-S; Jiang, Y-N] Chinese Acad Sci, Inst Mech, Key Lab Micrograv, Beijing 100190, Peoples R China; [Zhang, H.] Tsinghua Univ, Dept Engn Phys, Beijing 100084, Peoples R China
通讯作者Chen, QS (reprint author), Chinese Acad Sci, Inst Mech, Key Lab Micrograv, Beijing 100190, Peoples R China.
合作状况国内
中文摘要The physical vapor transport (PVT) method is used to grow silicon carbide (SiC) crystals, which are difficult to be grown by other methods. In this paper, a field-coordination theory is involved to optimize the SiC PVT growth process. By using a finite volume-based computational method, we calculate the flow field as well as species concentration field before and after improvement of the thermal design, respectively. The shape of the SiC crystal grown using the improved thermal design is also shown.
学科主题微重力流体力学
分类号二类/Q2
类目[WOS]Crystallography ; Materials Science, Multidisciplinary ; Physics, Applied
研究领域[WOS]Crystallography ; Materials Science ; Physics
关键词[WOS]PHYSICAL-VAPOR TRANSPORT ; CONVECTIVE HEAT-TRANSFER ; SUBLIMATION GROWTH ; BULK GROWTH ; CRYSTALS ; KINETICS ; MODEL
收录类别SCI ; EI
资助信息The work was supported by the National Natural Science Foundation of China under Grant nos.10972226 and 11272320.
原文出处http://dx.doi.org/10.1016/j.jcrysgro.2013.02.031
语种英语
WOS记录号WOS:000327250100007
公开日期2014-02-13
源URL[http://dspace.imech.ac.cn/handle/311007/48077]  
专题力学研究所_国家微重力实验室
推荐引用方式
GB/T 7714
Yan JY,Chen QS,Jiang YN,et al. Improvement of the thermal design in the SiC PVT growth process[J]. Journal of Crystal Growth,2014,385:34-37.
APA Yan JY,Chen QS,Jiang YN,&Zhang H.(2014).Improvement of the thermal design in the SiC PVT growth process.Journal of Crystal Growth,385,34-37.
MLA Yan JY,et al."Improvement of the thermal design in the SiC PVT growth process".Journal of Crystal Growth 385(2014):34-37.

入库方式: OAI收割

来源:力学研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。