中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Photoelectron escape depth and inelastic secondaries in high-temperature superconductors

文献类型:期刊论文

作者Norman, MR ; Randeria, M ; Ding, H ; Campuzano, JC
刊名PHYSICAL REVIEW B
出版日期1999
卷号59期号:17页码:11191
ISSN号0163-1829
通讯作者Norman, MR (reprint author), Argonne Natl Lab, Div Mat Sci, 9700 S Cass Ave, Argonne, IL 60439 USA.
中文摘要We calculate the photoelectron escape depth in the high-temperature superconductor Bi2212 by use of electron energy-loss spectroscopy data. We find that the escape depth is only 3 Angstrom for photon energies typically used in angle-resolved photoemission measurements. We then use this to estimate the number of inelastic secondaries, and find this to be quite small near the Fermi energy. This implies that the large background seen near the Fermi energy in photoemission measurements is of some other origin. [S0163-1829(99)08017-0].
收录类别SCI
语种英语
公开日期2014-02-20
源URL[http://ir.iphy.ac.cn/handle/311004/57974]  
专题物理研究所_所内人员在其他单位发表论文题录信息_所内人员在其他单位发表论文题录信息_期刊论文
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GB/T 7714
Norman, MR,Randeria, M,Ding, H,et al. Photoelectron escape depth and inelastic secondaries in high-temperature superconductors[J]. PHYSICAL REVIEW B,1999,59(17):11191.
APA Norman, MR,Randeria, M,Ding, H,&Campuzano, JC.(1999).Photoelectron escape depth and inelastic secondaries in high-temperature superconductors.PHYSICAL REVIEW B,59(17),11191.
MLA Norman, MR,et al."Photoelectron escape depth and inelastic secondaries in high-temperature superconductors".PHYSICAL REVIEW B 59.17(1999):11191.

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来源:物理研究所

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