The effects of negative bias and flux ratio on the properties of TiN thin films formed by filtered cathodic arc plasma technique
文献类型：期刊论文
| 作者 | Xue QJ(薛群基)
|
| 刊名 | Acta metallurgica sinica
 |
| 出版日期 | 2005 |
| 卷号 | 18期号:3页码:369-374 |
| 关键词 | TiN filtered cathodic arc plasma preferred orientation |
| ISSN号 | 0412-1961 |
| 中文摘要 | THE filtered cathodic vacuum-arc (FCVA) technique is a supplementary and alternative technique with respect to convendtional physical and chemical vapour deposition which can remove macro-particles effectively and make the deposition process at ambient temperature.In this work, high quality TiN thin films were deposited on silicon substrates at low temperature using the improved filtered cathodic arc plasma (FCAP) technique. AFM, XRD, TEM were employed to characterize the TiN thin films. The effects of the negative substrate bias on the grain size, preferred crystalline orientation, surface roughness of TiN thin films were discussed. |
| 学科主题 | 材料科学与物理化学 |
| 收录类别 | SCI |
| 资助信息 | the National Natural Science Foundation of China (No. 10074022);the Excellent Young Teachers Program of MOE, China |
| 语种 | 英语 |
| 公开日期 | 2014-03-03 |
| 源URL | [http://210.77.64.217/handle/362003/5285]  |
| 专题 | 兰州化学物理研究所_固体润滑国家重点实验室 |
| 推荐引用方式 GB/T 7714 | Xue QJ. The effects of negative bias and flux ratio on the properties of TiN thin films formed by filtered cathodic arc plasma technique[J]. Acta metallurgica sinica,2005,18(3):369-374. |
| APA | 薛群基.(2005).The effects of negative bias and flux ratio on the properties of TiN thin films formed by filtered cathodic arc plasma technique.Acta metallurgica sinica,18(3),369-374. |
| MLA | 薛群基."The effects of negative bias and flux ratio on the properties of TiN thin films formed by filtered cathodic arc plasma technique".Acta metallurgica sinica 18.3(2005):369-374. |
入库方式： OAI收割
来源：兰州化学物理研究所
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