Chemical Patterns for Directed Self-Assembly of Lamellae-Forming Block Copolymers with Density Multiplication of Features
文献类型：期刊论文
| 作者 | Liu CC ; Ramirez-Hernandez A ; Han E ; Craig GSW ; Tada Y ; Yoshida H ; Kang HM ; Ji SX ; Gopalan P ; de Pablo JJ ; Nealey PF |
| 刊名 | macromolecules
 |
| 出版日期 | 2013 |
| 卷号 | 46期号:4页码:1415-1424 |
| 关键词 | THIN-FILMS NANOPATTERNED SURFACES DIBLOCK COPOLYMERS LITHOGRAPHY DOMAINS PHOTORESIST SIMULATIONS FABRICATION DIMENSIONS BRUSHES |
| ISSN号 | 0024-9297 |
| 通讯作者 | de pablo jj |
| 中文摘要 | lamellae-forming polystyrene-block-poly(methyl methacrylate) (ps-b-pmma) films, with bulk period l-0, were directed to assemble on lithographically nanopatterned surfaces. the chemical pattern was comprised of "guiding" stripes of cross-linked polystyrene (x-ps) or poly(methyl methacrylate) (x-pmma) mats, with width w, and interspatial "background" regions of a random copolymer brush of styrene and methyl methacrylate (p(s-r-mma)). the fraction of styrene (f) in the brush was varied to control the chemistry of the background regions. the period of the pattern was l-s. after assembly, the density of the features (domains) in the block copolymer film was an integer multiple (n) of the density of features of the chemical pattern, where n = l-s/l-0. the quality of the assembled ps-b-pmma films into patterns of dense lines as a function of n, w/l-0, and f was analyzed with top-down scanning electron microscopy. the most effective background chemistry for directed assembly with density multiplication corresponded to a brush chemistry (f) that minimized the interfacial energy between the background regions and the composition of the film overlying the background regions. the three-dimensional structure of the domains within the film was investigated using cross-sectional sem and monte carlo simulations of a coarse-grained model and was found most closely to resemble perpendicularly oriented lamellae when w/l-0 similar to 0.5-0.6. directed self-assembly with density multiplication (n = 4) and w/l-0 = 1 or 1.5 yields pattern of high quality, parallel linear structures on the top surface of the assembled films, but complex, three-dimensional structures within the film. |
| 收录类别 | SCI收录期刊论文 |
| 语种 | 英语 |
| WOS记录号 | WOS:000315618800020 |
| 公开日期 | 2014-04-16 |
| 源URL | [http://ir.ciac.jl.cn/handle/322003/50020]  |
| 专题 | 长春应用化学研究所_长春应用化学研究所知识产出_期刊论文 |
| 推荐引用方式 GB/T 7714 | Liu CC,Ramirez-Hernandez A,Han E,et al. Chemical Patterns for Directed Self-Assembly of Lamellae-Forming Block Copolymers with Density Multiplication of Features[J]. macromolecules,2013,46(4):1415-1424. |
| APA | Liu CC.,Ramirez-Hernandez A.,Han E.,Craig GSW.,Tada Y.,...&Nealey PF.(2013).Chemical Patterns for Directed Self-Assembly of Lamellae-Forming Block Copolymers with Density Multiplication of Features.macromolecules,46(4),1415-1424. |
| MLA | Liu CC,et al."Chemical Patterns for Directed Self-Assembly of Lamellae-Forming Block Copolymers with Density Multiplication of Features".macromolecules 46.4(2013):1415-1424. |
入库方式： OAI收割
来源：长春应用化学研究所
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