Hydrogenation of Silicon Tetrachloride in Microwave Plasma
文献类型：期刊论文
| 作者 | Lu Zhenxi1,2; Zhang Weigang1 |
| 刊名 | CHINESE JOURNAL OF CHEMICAL ENGINEERING
 |
| 出版日期 | 2014-02-01 |
| 卷号 | 22期号:2页码:227-233 |
| 关键词 | hydrogenation silicon tetrachloride non-thermodynamic equilibrium plasma equilibrium constant plasma temperature |
| ISSN号 | 1004-9541 |
| 其他题名 | Chin. J. Chem. Eng. |
| 中文摘要 | This study investigated the hydrogenation of silicon tetrachloride (SiCl4) in microwave plasma. A new launcher of argon (Ar) and hydrogen (H-2) plasma was introduced to produce a non-thermodynamic equilibrium activation plasma. The plasma state exhibited a characteristic temperature related to the equilibrium constant, which was termed "Reactive Temperature" in this study. Thus, the hydrogenation of SiCl4 in the plasma could easily be handled with high conversion ratio and very high selectivity to trichlorosilane (SiHCl3). The effects of SiCl4/Ar and H-2/Ar ratios on the conversion were also investigated using a mathematical model developed to determine the optimum experimental parameters. The highest hydrogenation conversion ratio was produced at a H-2/SiCl4 molar ratio of 1, with mixtures of SiCl4 and H-2 to Ar molar ratio of 1.2 to 1.4. In this plasma, the special system pressure and incident power were required for the highest energy efficiency of hydrogenating SiCl4, while the optimum system pressure varies from 26.6 to 40 kPa depending on input power, and the optimum feed gas (H-2 and SiCl4) molar energy input was about 350 kJ.mol(-1). |
| 英文摘要 | This study investigated the hydrogenation of silicon tetrachloride (SiCl4) in microwave plasma. A new launcher of argon (Ar) and hydrogen (H-2) plasma was introduced to produce a non-thermodynamic equilibrium activation plasma. The plasma state exhibited a characteristic temperature related to the equilibrium constant, which was termed "Reactive Temperature" in this study. Thus, the hydrogenation of SiCl4 in the plasma could easily be handled with high conversion ratio and very high selectivity to trichlorosilane (SiHCl3). The effects of SiCl4/Ar and H-2/Ar ratios on the conversion were also investigated using a mathematical model developed to determine the optimum experimental parameters. The highest hydrogenation conversion ratio was produced at a H-2/SiCl4 molar ratio of 1, with mixtures of SiCl4 and H-2 to Ar molar ratio of 1.2 to 1.4. In this plasma, the special system pressure and incident power were required for the highest energy efficiency of hydrogenating SiCl4, while the optimum system pressure varies from 26.6 to 40 kPa depending on input power, and the optimum feed gas (H-2 and SiCl4) molar energy input was about 350 kJ.mol(-1). |
| WOS标题词 | Science & Technology ; Technology |
| 类目[WOS] | Engineering, Chemical |
| 研究领域[WOS] | Engineering |
| 关键词[WOS] | ATMOSPHERIC-PRESSURE ; DISCHARGE |
| 收录类别 | SCI |
| 原文出处 | |
| 语种 | 英语 |
| WOS记录号 | WOS:000331476400016 |
| 公开日期 | 2014-05-06 |
| 版本 | 出版稿 |
| 源URL | [http://ir.ipe.ac.cn/handle/122111/8118]  |
| 专题 | 过程工程研究所_研究所（批量导入） |
| 作者单位 | 1.Chinese Acad Sci, Inst Proc Engn, State Key Lab Multiphase Complex Syst, Beijing 100190, Peoples R China 2.Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China |
| 推荐引用方式 GB/T 7714 | Lu Zhenxi,Zhang Weigang. Hydrogenation of Silicon Tetrachloride in Microwave Plasma[J]. CHINESE JOURNAL OF CHEMICAL ENGINEERING,2014,22(2):227-233. |
| APA | Lu Zhenxi,&Zhang Weigang.(2014).Hydrogenation of Silicon Tetrachloride in Microwave Plasma.CHINESE JOURNAL OF CHEMICAL ENGINEERING,22(2),227-233. |
| MLA | Lu Zhenxi,et al."Hydrogenation of Silicon Tetrachloride in Microwave Plasma".CHINESE JOURNAL OF CHEMICAL ENGINEERING 22.2(2014):227-233. |
入库方式： OAI收割
来源：过程工程研究所
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