中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Fabrication of tellurium doped silicon detector by femtosecond laser and excimer laser

文献类型:期刊论文

作者Wang, Xiyuan ; Huang, Yongguang ; Liu, Dewei ; Zhu, Xiaoning ; Wang, Baojun ; Zhu, Hongliang
刊名chinese journal of lasers
出版日期2013
卷号40期号:3页码:0302001
学科主题半导体材料
收录类别EI
语种英语
公开日期2014-05-08
源URL[http://ir.semi.ac.cn/handle/172111/24913]  
专题半导体研究所_中科院半导体材料科学重点实验室
推荐引用方式
GB/T 7714
Wang, Xiyuan,Huang, Yongguang,Liu, Dewei,et al. Fabrication of tellurium doped silicon detector by femtosecond laser and excimer laser[J]. chinese journal of lasers,2013,40(3):0302001.
APA Wang, Xiyuan,Huang, Yongguang,Liu, Dewei,Zhu, Xiaoning,Wang, Baojun,&Zhu, Hongliang.(2013).Fabrication of tellurium doped silicon detector by femtosecond laser and excimer laser.chinese journal of lasers,40(3),0302001.
MLA Wang, Xiyuan,et al."Fabrication of tellurium doped silicon detector by femtosecond laser and excimer laser".chinese journal of lasers 40.3(2013):0302001.

入库方式: OAI收割

来源:半导体研究所

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