A lithography-independent and fully confined fabrication process of phase-change materials in metal electrode nanogap with 16-μA threshold current and 80-mV SET voltage
文献类型：期刊论文
| 作者 | Yingchun Fu, Xiaofeng Wang, Jiayong Zhang, Xiaodong Wang, Chun Chang, Huili Ma, Kaifang Cheng, Xiaogang Chen, Zhitang Song, Songlin Feng, An Ji, Fuhua Yang |
| 刊名 | Applied Physics A: Materials Science and Processing
 |
| 出版日期 | 2013 |
| 卷号 | 110期号:1页码:173-177 |
| 学科主题 | 微电子学 |
| 收录类别 | EI |
| 语种 | 英语 |
| 公开日期 | 2014-05-08 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/24910]  |
| 专题 | 半导体研究所_半导体集成技术工程研究中心 |
| 推荐引用方式 GB/T 7714 | Yingchun Fu, Xiaofeng Wang, Jiayong Zhang, Xiaodong Wang, Chun Chang, Huili Ma, Kaifang Cheng, Xiaogang Chen, Zhitang Song, Songlin Feng, An Ji, Fuhua Yang. A lithography-independent and fully confined fabrication process of phase-change materials in metal electrode nanogap with 16-μA threshold current and 80-mV SET voltage[J]. Applied Physics A: Materials Science and Processing,2013,110(1):173-177. |
| APA | Yingchun Fu, Xiaofeng Wang, Jiayong Zhang, Xiaodong Wang, Chun Chang, Huili Ma, Kaifang Cheng, Xiaogang Chen, Zhitang Song, Songlin Feng, An Ji, Fuhua Yang.(2013).A lithography-independent and fully confined fabrication process of phase-change materials in metal electrode nanogap with 16-μA threshold current and 80-mV SET voltage.Applied Physics A: Materials Science and Processing,110(1),173-177. |
| MLA | Yingchun Fu, Xiaofeng Wang, Jiayong Zhang, Xiaodong Wang, Chun Chang, Huili Ma, Kaifang Cheng, Xiaogang Chen, Zhitang Song, Songlin Feng, An Ji, Fuhua Yang."A lithography-independent and fully confined fabrication process of phase-change materials in metal electrode nanogap with 16-μA threshold current and 80-mV SET voltage".Applied Physics A: Materials Science and Processing 110.1(2013):173-177. |
入库方式： OAI收割
来源：半导体研究所
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