Influence of growth conditions on the lateral grain size of AlN film grown by metal-organic chemical vapor deposition
文献类型：期刊论文
| 作者 | Wu Liang-Liang, Zhao De-Gang, Li Liang, Le Ling-Cong, Chen Ping, Liu Zong-Shun, Jiang De-Sheng |
| 刊名 | acta physica sinica
 |
| 出版日期 | 2013 |
| 卷号 | 62期号:8页码:086102 |
| 学科主题 | 光电子学 |
| 收录类别 | EI |
| 语种 | 英语 |
| 公开日期 | 2014-05-16 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/24979]  |
| 专题 | 半导体研究所_集成光电子学国家重点实验室 |
| 推荐引用方式 GB/T 7714 | Wu Liang-Liang, Zhao De-Gang, Li Liang, Le Ling-Cong, Chen Ping, Liu Zong-Shun, Jiang De-Sheng. Influence of growth conditions on the lateral grain size of AlN film grown by metal-organic chemical vapor deposition[J]. acta physica sinica,2013,62(8):086102. |
| APA | Wu Liang-Liang, Zhao De-Gang, Li Liang, Le Ling-Cong, Chen Ping, Liu Zong-Shun, Jiang De-Sheng.(2013).Influence of growth conditions on the lateral grain size of AlN film grown by metal-organic chemical vapor deposition.acta physica sinica,62(8),086102. |
| MLA | Wu Liang-Liang, Zhao De-Gang, Li Liang, Le Ling-Cong, Chen Ping, Liu Zong-Shun, Jiang De-Sheng."Influence of growth conditions on the lateral grain size of AlN film grown by metal-organic chemical vapor deposition".acta physica sinica 62.8(2013):086102. |
入库方式： OAI收割
来源：半导体研究所
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