Electron beam evaporation broad beam metal ion source for material modifications
文献类型:会议论文
作者 | Feng YC(冯毓才); Li, X. G.; Yang ST(杨松涛) |
出版日期 | 1996 |
会议名称 | 6th International Conference on Ion Sources |
会议日期 | 1996 |
会议地点 | Whistler, Canada |
页码 | 924-926 |
英文摘要 | This paper describes a new type of electron beam evaporation intense beam current broad beam metal ion source. In this ion source, a focusing electron beam is used to bombard and vaporize the metal and other solid elements within the same chamber where the metal and solid element atoms are ionized by are discharge. It can operate with gaseous and solid elements. Both pure or mixed ions with single or multiple charge states can also be extracted from this source. The performance and the characteristics of this source have tested. Ion beams of a series of elements, which include C, W, Ta, Mo, Cr, Ti, B, Cu, Ni, AI, Ar, N, etc., have been extracted, and the highest beam current is up to 90 mA. By using this ion beam bombardment, a good mixture between substrate and film was observed. Deposition rates as high as 25 Angstrom/s for Mo, 30 Angstrom/s for Ti, and 80 Angstrom/s for C have been obtained. The structure of the ion source and the experimental results will be presented in this paper. |
收录类别 | CPCI |
会议录 | Review of scientific instruments
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会议录出版者 | Amer Inst Physics |
学科主题 | 空间技术 |
会议录出版地 | WOODBURY |
语种 | 英语 |
ISBN号 | 0034-6748 |
源URL | [http://ir.cssar.ac.cn/handle/122/540] ![]() |
专题 | 国家空间科学中心_空间技术部 |
推荐引用方式 GB/T 7714 | Feng YC,Li, X. G.,Yang ST. Electron beam evaporation broad beam metal ion source for material modifications[C]. 见:6th International Conference on Ion Sources. Whistler, Canada. 1996. |
入库方式: OAI收割
来源:国家空间科学中心
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