Simulation and modelling of sub-30 nm polymeric channels fabricated by electrostatic induced lithography
文献类型：期刊论文
| 作者 | Zhang L.; Zhang L.; Liu Z.
|
| 刊名 | Rsc Advances
 |
| 出版日期 | 2013 |
| 卷号 | 3期号:29 |
| ISSN号 | ISBN/2046-2069 |
| 英文摘要 | This article demonstrates, through finite element analysis, the possibility to manufacture sub-30 nm polymeric channels using electrostatic induced lithography. Channels with a width of 25 nm, a depth of 50 nm and an inter-channel wall of 28 nm can be obtained by this patterning process. The influence of operational parameters such as the filling factor, the aspect ratio of the master electrode, the applied voltage and the gap between the two electrodes and initial film thickness has been studied in detail to define the fabrication limits of this process in the case of periodic nanostructures. Conclusions for such nanostructures can be generalised to other shapes manufactured from polymers. |
| 收录类别 | SCI ; EI |
| 语种 | 英语 |
| 公开日期 | 2014-05-14 |
| 源URL | [http://ir.ciomp.ac.cn/handle/181722/40851]  |
| 专题 | 长春光学精密机械与物理研究所_中科院长春光机所知识产出 |
| 推荐引用方式 GB/T 7714 | Zhang L.,Zhang L.,Liu Z.. Simulation and modelling of sub-30 nm polymeric channels fabricated by electrostatic induced lithography[J]. Rsc Advances,2013,3(29). |
| APA | Zhang L.,Zhang L.,&Liu Z..(2013).Simulation and modelling of sub-30 nm polymeric channels fabricated by electrostatic induced lithography.Rsc Advances,3(29). |
| MLA | Zhang L.,et al."Simulation and modelling of sub-30 nm polymeric channels fabricated by electrostatic induced lithography".Rsc Advances 3.29(2013). |
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