Fabrication fluoride high reflection mirror by thermal evaporation in the ArF excimer laser
文献类型：会议论文
| 作者 | Li C.
|
| 出版日期 | 2013 |
| 会议名称 | Asia Pacific Conference on Optics Manufacture 2012, APCOM 2012, August 26, 2012 - August 28, 2012 |
| 会议地点 | Changchun, China |
| 页码 | 252-255 |
| 英文摘要 | ArF excimer laser is the main light resource for the microlithography technology. In the laser cavity, the optical components with lowest absorption and scattering loss are necessary. As a consequence only a few materials are promising candidates for 193nm coatings with high transmittance or high reflectance. Fluoride films exhibit relatively low optical loss as well as high laser induced damage thresholds. The potentiality of LaF3 and MgF2 is evaluated in respect of the production of improved optical coatings for applications. For this purpose, single layer is prepared by thermal evaporation at the deposited temperatures of 523K on Fused Silica. A first order bulk inhomogeneity model for extracting the optical constants of weak absorbing film is applied, which is based on spectrophotometry. Refractive index (n) and extinction coefficient (k) of the optimal LaF3 film are 1.678 and 2.2410-3 at 193nm. In the case of the optimal MgF2 film, n and k are 1.443 and 4.7210-4 at 193nm. High reflection (HR) LaF3/MgF2 coatings are designed and fabricated for normal incident on CaF2. The experimental results indicate that after coated and fluoride coatings deposit, according to optimal process, can have more suitable optical properties at deep ultraviolet (DUV), the reflectance of HR coatings reaches more than 98% at 193nm. (2013) Trans Tech Publications, Switzerland. |
| 收录类别 | EI |
| 会议录 | Asia Pacific Conference on Optics Manufacture 2012, APCOM 2012, August 26, 2012 - August 28, 2012
 |
| 会议录出版者 | Trans Tech Publications Ltd |
| 会议录出版地 | Changchun, China |
| 源URL | [http://ir.ciomp.ac.cn/handle/181722/40955]  |
| 专题 | 长春光学精密机械与物理研究所_中科院长春光机所知识产出_会议论文 |
| 推荐引用方式 GB/T 7714 | Li C.. Fabrication fluoride high reflection mirror by thermal evaporation in the ArF excimer laser[C]. 见:Asia Pacific Conference on Optics Manufacture 2012, APCOM 2012, August 26, 2012 - August 28, 2012. Changchun, China. |
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