Microstructure and properties of AlB2-type WB2 thin films deposited by direct-current magnetron sputtering
文献类型：期刊论文
| 作者 | Y. M. Liu ; C. L. Jiang ; Z. L. Pei ; H. Lei ; J. Gong ; C. Sun |
| 刊名 | Surface & Coatings Technology
 |
| 出版日期 | 2014 |
| 卷号 | 245页码:108-116 |
| 关键词 | AlB2-type WB2 films DC magnetron sputtering Hardness Tribological properties Self-lubricating boric-acid films mechanical-properties enhanced resistance oxide coatings hard coatings bias voltage tool steel al substrate tungsten |
| ISSN号 | 0257-8972 |
| 原文出处 | |
| 语种 | 英语 |
| 公开日期 | 2014-07-03 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/72884]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | Y. M. Liu,C. L. Jiang,Z. L. Pei,et al. Microstructure and properties of AlB2-type WB2 thin films deposited by direct-current magnetron sputtering[J]. Surface & Coatings Technology,2014,245:108-116. |
| APA | Y. M. Liu,C. L. Jiang,Z. L. Pei,H. Lei,J. Gong,&C. Sun.(2014).Microstructure and properties of AlB2-type WB2 thin films deposited by direct-current magnetron sputtering.Surface & Coatings Technology,245,108-116. |
| MLA | Y. M. Liu,et al."Microstructure and properties of AlB2-type WB2 thin films deposited by direct-current magnetron sputtering".Surface & Coatings Technology 245(2014):108-116. |
入库方式： OAI收割
来源：金属研究所
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