Removal of silicon in acid leaching and flocculation processes during zirconium oxychloride octahydrate production
文献类型：期刊论文
| 作者 | Liu, Ran1,2,3; Xue, Tianyan1,2; Song, Jing1,2; Wang, Yu1,2; Qi, Tao1,2; Qu, Jingkui1,2; Du, Ailing3 |
| 刊名 | CERAMICS INTERNATIONAL
 |
| 出版日期 | 2014-07-01 |
| 卷号 | 40期号:6页码:8801-8808 |
| 关键词 | Zirconium oxychloride Acid leaching Flocculation |
| ISSN号 | 0272-8842 |
| 其他题名 | Ceram. Int. |
| 中文摘要 | The efficiency of silicon removal technology by acid leaching and flocculation during zirconium oxychloride octahydrate (ZrOCl2 center dot 8 H2O) production has been improved. The optimum conditions of acid leaching were found to be as follows: transiton material, 300 g; HCl (6 mol/L), 600 mL; leaching time, 4 h; and leaching temperature, 100 degrees C. The nonionic polyoxyethylene lauryl ether (AEO9) was adopted as the flocculant. The optimum flocculation conditions were found to be as follows: temperature, 40 degrees C; flocculant amount, 10 ml (concentration 1%); time, 1 h. The zirconium oxychloride solution after purification contained 36 ppm SiO2 and 160 g/L ZrOCl2. The polymerization and flocculation mechanisms of silicic acid were analyzed. Results of Fourier-transform infrared, scanning electron microscopy, nuclear magnetic resonance, and Brunauer-Emmett-Teller analyses showed the main transformation and properties of the products in the acid leaching and flocculation processes. (C) 2014 Elsevier Ltd and Techna Group S.r.l. All rights reserved. |
| 英文摘要 | The efficiency of silicon removal technology by acid leaching and flocculation during zirconium oxychloride octahydrate (ZrOCl2 center dot 8 H2O) production has been improved. The optimum conditions of acid leaching were found to be as follows: transiton material, 300 g; HCl (6 mol/L), 600 mL; leaching time, 4 h; and leaching temperature, 100 degrees C. The nonionic polyoxyethylene lauryl ether (AEO9) was adopted as the flocculant. The optimum flocculation conditions were found to be as follows: temperature, 40 degrees C; flocculant amount, 10 ml (concentration 1%); time, 1 h. The zirconium oxychloride solution after purification contained 36 ppm SiO2 and 160 g/L ZrOCl2. The polymerization and flocculation mechanisms of silicic acid were analyzed. Results of Fourier-transform infrared, scanning electron microscopy, nuclear magnetic resonance, and Brunauer-Emmett-Teller analyses showed the main transformation and properties of the products in the acid leaching and flocculation processes. (C) 2014 Elsevier Ltd and Techna Group S.r.l. All rights reserved. |
| WOS标题词 | Science & Technology ; Technology |
| 类目[WOS] | Materials Science, Ceramics |
| 研究领域[WOS] | Materials Science |
| 关键词[WOS] | REVERSE-OSMOSIS MEMBRANES ; SURFACE-CHEMISTRY ; AMORPHOUS SILICA ; FUSION ; MODEL ; NMR |
| 收录类别 | SCI |
| 原文出处 | |
| 语种 | 英语 |
| WOS记录号 | WOS:000335201800144 |
| 公开日期 | 2014-08-28 |
| 版本 | 出版稿 |
| 源URL | [http://ir.ipe.ac.cn/handle/122111/10941]  |
| 专题 | 过程工程研究所_研究所（批量导入） |
| 作者单位 | 1.Natl Engn Lab Hydromet Cleaner Prod Technol, Beijing 100190, Peoples R China 2.Chinese Acad Sci, Inst Proc Engn, Key Lab Green Proc & Engn, Beijing 100190, Peoples R China 3.Shandong Univ, Sch Chem & Chem Engn, Jinan 250100, Shandong, Peoples R China |
| 推荐引用方式 GB/T 7714 | Liu, Ran,Xue, Tianyan,Song, Jing,et al. Removal of silicon in acid leaching and flocculation processes during zirconium oxychloride octahydrate production[J]. CERAMICS INTERNATIONAL,2014,40(6):8801-8808. |
| APA | Liu, Ran.,Xue, Tianyan.,Song, Jing.,Wang, Yu.,Qi, Tao.,...&Du, Ailing.(2014).Removal of silicon in acid leaching and flocculation processes during zirconium oxychloride octahydrate production.CERAMICS INTERNATIONAL,40(6),8801-8808. |
| MLA | Liu, Ran,et al."Removal of silicon in acid leaching and flocculation processes during zirconium oxychloride octahydrate production".CERAMICS INTERNATIONAL 40.6(2014):8801-8808. |
入库方式： OAI收割
来源：过程工程研究所
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