中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Double humps and radiation effects of SOI NMOSFET

文献类型:期刊论文

作者Cui, Jiangwei; Yu, Xuefeng; Ren, Diyuan; He, Chengfa; Gao, Bo; Li, Ming; Lu, Jian
刊名Journal of Semiconductors
出版日期2011
卷号32期号:6
ISSN号16744926
英文摘要Radiation experiments have been carried out with a SOI NMOSFET. The behavior of double humps was studied under irradiation. The characterization of the hump was demonstrated. The results have shown that the shape of the hump changed along with the total dose and the reason for this was analyzed. In addition, the coupling effect of the back-gate transistor was more important for the main transistor than the parasitic transistor.
收录类别EI
WOS记录号CSCD:4391584
公开日期2014-11-11
源URL[http://ir.xjipc.cas.cn/handle/365002/4158]  
专题新疆理化技术研究所_材料物理与化学研究室
作者单位Xinjiang Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Urumqi 830011, China;Xinjiang Key Laboratory of Electronic Information Materials and Devices, Urumqi 830011, China;Graduate University of the Chinese Academy of Sciences, Beijing 100049, China
推荐引用方式
GB/T 7714
Cui, Jiangwei,Yu, Xuefeng,Ren, Diyuan,et al. Double humps and radiation effects of SOI NMOSFET[J]. Journal of Semiconductors,2011,32(6).
APA Cui, Jiangwei.,Yu, Xuefeng.,Ren, Diyuan.,He, Chengfa.,Gao, Bo.,...&Lu, Jian.(2011).Double humps and radiation effects of SOI NMOSFET.Journal of Semiconductors,32(6).
MLA Cui, Jiangwei,et al."Double humps and radiation effects of SOI NMOSFET".Journal of Semiconductors 32.6(2011).

入库方式: OAI收割

来源:新疆理化技术研究所

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