Epitaxial growth of Mn-Co-Ni-O thin films and thickness effects on the electrical properties
文献类型：期刊论文
| 作者 | Ji, Guang; Chang, Aimin ; Li, Hongyi; Xie, Yahong; Zhang, Huimin; Kong, Wenwen
|
| 刊名 | Materials Letters
 |
| 出版日期 | 2014 |
| 卷号 | 130期号:9页码:127-130 |
| 关键词 | Thin films Epitaxial growth Electrical properties Negative temperature coefficient thermistor Thickness effects |
| ISSN号 | 0167577X |
| 通讯作者 | Chang, AM |
| 英文摘要 | Mn1.56Co0.96Ni0.48O4 (MCN) thin films were grown on thermally oxidized Si(1 0 0) substrates using laser molecular beam epitaxy technique. The X-ray diffraction and high-resolution transmission electron microscopy analyses indicated an epitaxial structure with [1 0 0] growth direction and a lattice parameter of 8.28 A˚. The resistivity-temperature relationships of the epitaxial MCN thin films exhibited negative temperature coefficient thermistor characteristics, and the electron conduction mechanism was found to be nearest-neighbor hopping. Interestingly, the room temperature resistivity ρ25, the characteristic temperature T0, the activation energy Ea, and the temperature coefficient of resistance αT were all highly dependent on the film thickness t, and as t increased all of them decreased. An approximately linear relation was further revealed between ρ25 and 1/t2, which could be approximately expressed as ρ25(t)=211.7+119.1×104/t2 (t in nm; ρ25 in Ω cm). The successful growth of epitaxial MCN thin films opens a door for studying the effects of thickness on the electrical properties of MCN thin films, and may consequently provide an alternative approach for controlling the properties. |
| 收录类别 | SCI |
| WOS记录号 | WOS:000338804300035 |
| 公开日期 | 2014-11-11 |
| 源URL | [http://ir.xjipc.cas.cn/handle/365002/3746]  |
| 专题 | 新疆理化技术研究所_中国科学院特殊环境功能材料与器件重点试验室 新疆理化技术研究所_材料物理与化学研究室 |
| 作者单位 | Chinese Acad Sci, Xinjiang Tech Inst Phys & Chem, Key Lab Funct Mat & Devices Special Environm, Xinjiang Key Lab Elect Informat Mat & Devices, Urumqi 830011, Peoples R China;Univ Chinese Acad Sci, Beijing 100049, Peoples R China;Qual Prod Supervis & Inspect Inst Technol, Urumqi 830011, Xinjiang Uygur, Peoples R China;Xinjiang Univ, Key Lab Oil & Gas Fine Chem, Minist Educ & Xinjiang Uyghur Autonomous Reg, Urumqi 830046, Peoples R China |
| 推荐引用方式 GB/T 7714 | Ji, Guang,Chang, Aimin,Li, Hongyi,et al. Epitaxial growth of Mn-Co-Ni-O thin films and thickness effects on the electrical properties[J]. Materials Letters,2014,130(9):127-130. |
| APA | Ji, Guang,Chang, Aimin,Li, Hongyi,Xie, Yahong,Zhang, Huimin,&Kong, Wenwen.(2014).Epitaxial growth of Mn-Co-Ni-O thin films and thickness effects on the electrical properties.Materials Letters,130(9),127-130. |
| MLA | Ji, Guang,et al."Epitaxial growth of Mn-Co-Ni-O thin films and thickness effects on the electrical properties".Materials Letters 130.9(2014):127-130. |
入库方式： OAI收割
来源：新疆理化技术研究所
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