Influence of Applied Bias Voltage on the Composition, Structure, and Properties of Ti:Si-Codoped a-C:H Films Prepared by Magnetron Sputtering
文献类型：期刊论文
| 作者 | Jiang JL(姜金龙)1,2; Wang Q(王琼)1; Wang YB(王玉宝)1; Zhang X(张霞)1; Yang H(杨华)1; Hao JY(郝俊英)2
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| 刊名 | Journal of Nanomaterials
 |
| 出版日期 | 2014 |
| 页码 | 937068-7 |
| ISSN号 | 1687-4110 |
| 通讯作者 | 姜金龙 |
| 英文摘要 | The titanium- and silicon-codoped a-C:H films were prepared at different applied bias voltage by magnetron sputtering TiSi target in argon and methane mixture atmosphere. The influence of the applied bias voltage on the composition, surface morphology, structure, and mechanical properties of the films was investigated by XPS, AFM, Raman, FTIR spectroscopy, and nanoindenter. The tribological properties of the films were characterized on an UMT-2MT tribometer. The results demonstrated that the film became smoother and denser with increasing the applied bias voltage up to −200V, whereas surface roughness increased due to the enhancement of ion bombardment as the applied bias voltage further increased. The sp3 carbon fraction in the filmsmonotonously decreased with increasing the applied bias voltage.The film exhibited moderate hardness and the superior tribological properties at the applied bias voltage of −100V.The tribological behaviors are correlated to the H/E or H3/E2 ratio of the films. |
| 学科主题 | 材料科学与物理化学 |
| 资助信息 | the Natural Science Foundation of China (51105186);the Excellent Young Teachers Program of Lanzhou University of Technology (1010ZCX010);the Doctoral Research grant of Lanzhou University of Technology |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000332860800001 |
| 公开日期 | 2014-12-17 |
| 源URL | [http://210.77.64.217/handle/362003/6992]  |
| 专题 | 兰州化学物理研究所_固体润滑国家重点实验室 |
| 作者单位 | 1.Lanzhou Univ Technol, Dept Phys, Lanzhou 730050, Peoples R China 2.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China |
| 推荐引用方式 GB/T 7714 | Jiang JL,Wang Q,Wang YB,et al. Influence of Applied Bias Voltage on the Composition, Structure, and Properties of Ti:Si-Codoped a-C:H Films Prepared by Magnetron Sputtering[J]. Journal of Nanomaterials,2014:937068-7. |
| APA | Jiang JL,Wang Q,Wang YB,Zhang X,Yang H,&Hao JY.(2014).Influence of Applied Bias Voltage on the Composition, Structure, and Properties of Ti:Si-Codoped a-C:H Films Prepared by Magnetron Sputtering.Journal of Nanomaterials,937068-7. |
| MLA | Jiang JL,et al."Influence of Applied Bias Voltage on the Composition, Structure, and Properties of Ti:Si-Codoped a-C:H Films Prepared by Magnetron Sputtering".Journal of Nanomaterials (2014):937068-7. |
入库方式： OAI收割
来源：兰州化学物理研究所
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