中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
SEE characteristics of small feature size devices by using laser backside testing

文献类型:期刊论文

作者Feng, Guoqiang; Shangguan, Shipeng; Ma, Yingqi; Han, Jianwei
刊名Journal of Semiconductors
出版日期2012
卷号33期号:1
ISSN号1674-4926
通讯作者Feng, G. (gqfeng@cssar.ac.cn)
中文摘要This paper presents single event upset (SEU) and single event latch-up (SEL) characteristics of small feature size devices by laser backside testing method, which is dedicated to dealing with the increasing metal layers on the front side of integrated circuits. The influence of test data pattern on SEU threshold and cross-section is investigated. The supply current state of micro latch-up for deep sub-micron SRAM is described. The laser energy thresholds were correlated to heavy ion thresholds LET to determine an empirical relationship between laser energy threshold and heavy ion LET. This empirical relationship was used to estimate the equivalent laser LETs for devices fabricated in small feature sizes. Moreover, the SEU of a Power PC CPU fabricated with 90 nm SOI CMOS process has been tested, which indicates that the laser backside method could be used to evaluate SOI small feature size devices. © 2012 Chinese Institute of Electronics.
英文摘要This paper presents single event upset (SEU) and single event latch-up (SEL) characteristics of small feature size devices by laser backside testing method, which is dedicated to dealing with the increasing metal layers on the front side of integrated circuits. The influence of test data pattern on SEU threshold and cross-section is investigated. The supply current state of micro latch-up for deep sub-micron SRAM is described. The laser energy thresholds were correlated to heavy ion thresholds LET to determine an empirical relationship between laser energy threshold and heavy ion LET. This empirical relationship was used to estimate the equivalent laser LETs for devices fabricated in small feature sizes. Moreover, the SEU of a Power PC CPU fabricated with 90 nm SOI CMOS process has been tested, which indicates that the laser backside method could be used to evaluate SOI small feature size devices. © 2012 Chinese Institute of Electronics.
学科主题空间环境
收录类别EI
语种英语
公开日期2014-12-15
源URL[http://ir.nssc.ac.cn/handle/122/2863]  
专题国家空间科学中心_保障部/保障与试验验证中心
推荐引用方式
GB/T 7714
Feng, Guoqiang,Shangguan, Shipeng,Ma, Yingqi,et al. SEE characteristics of small feature size devices by using laser backside testing[J]. Journal of Semiconductors,2012,33(1).
APA Feng, Guoqiang,Shangguan, Shipeng,Ma, Yingqi,&Han, Jianwei.(2012).SEE characteristics of small feature size devices by using laser backside testing.Journal of Semiconductors,33(1).
MLA Feng, Guoqiang,et al."SEE characteristics of small feature size devices by using laser backside testing".Journal of Semiconductors 33.1(2012).

入库方式: OAI收割

来源:国家空间科学中心

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