Variation of Surface Roughness of Ti3SiC2 Disk during Polishing in Water and Alcohols
文献类型：期刊论文
| 作者 | Hai WX(海万秀) ; Ceng JL(曾俊菱); Meng JH(孟军虎); Lv JJ(吕晋军)
|
| 刊名 | Key Engineering Materials
 |
| 出版日期 | 2014 |
| 卷号 | 602-603页码:511-514 |
| 关键词 | Ti3SiC2 Alcohols Surface finishing Surface roughness |
| ISSN号 | 1013-9826 |
| 通讯作者 | 孟军虎 |
| 英文摘要 | The surface polishing of Ti3SiC2 disk in fluids (water, ethanol, propanol, glycol, and glycerol) is conducted on a Buehler grinder/polisher and evaluated using surface roughness. Using Buehler automatic grinder/polisher, the Ti3SiC2 disks are grinded and polished in the as-mentioned lubricants by grinding disk of diamond with sizes of 45 μm to 3 μm. The surface roughnesses of Ti3SiC2 disks at each stage are measured by 3D surface profiler. The results show that the lowest surface roughness (Ra) of Ti3SiC2 disk obtained by mechanical polishing is 0.04 μm. The optimum polishing process of Ti3SiC2 disk is as follows: using water as lubricant, at a load of 5 N, for steps 1 to 4, the Ti3SiC2 and grinding disk rotates comparatively and the sizes of diamond particles on the abrasive disk are 45, 15, 9, and 3 μm, respectively. For step 5, the abrasive disk is woven cloth with no diamond particles. The duration of each step is 5 min. Using the same polishing process, the surface roughness of Ti3SiC2 disk by direct hot pressing is lower than that by in situ reactive hot pressing. Using the same polishing process but different lubricants, the surface roughness of the Ti3SiC2 disks increases in the order of water, ethanol, propanol, glycol, and glycerol. In water, the surface roughness of Ti3SiC2 disk decreases with the increasing quantity of water and polishing duration. |
| 学科主题 | 材料科学与物理化学 |
| 收录类别 | EI |
| 资助信息 | the “Hundred Talents Program” (Junhu Meng) of Chinese Academy of Sciences;the National Natural Science Foundation of China (51075382) |
| 语种 | 英语 |
| 公开日期 | 2014-12-24 |
| 源URL | [http://210.77.64.217/handle/362003/7059]  |
| 专题 | 兰州化学物理研究所_先进润滑与防护材料研究发展中心 兰州化学物理研究所_固体润滑国家重点实验室 |
| 推荐引用方式 GB/T 7714 | Hai WX,Ceng JL,Meng JH,et al. Variation of Surface Roughness of Ti3SiC2 Disk during Polishing in Water and Alcohols[J]. Key Engineering Materials,2014,602-603:511-514. |
| APA | Hai WX,Ceng JL,Meng JH,&Lv JJ.(2014).Variation of Surface Roughness of Ti3SiC2 Disk during Polishing in Water and Alcohols.Key Engineering Materials,602-603,511-514. |
| MLA | Hai WX,et al."Variation of Surface Roughness of Ti3SiC2 Disk during Polishing in Water and Alcohols".Key Engineering Materials 602-603(2014):511-514. |
入库方式： OAI收割
来源：兰州化学物理研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。