中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Investigation of high hole mobility In0.41Ga0.59Sb/Al0.91Ga0.09Sb quantum well structures grown by molecular beam epitaxy

文献类型:期刊论文

;
作者Wang, J; Xing, JL; Xiang, W; Wang, GW; Xu, YQ; Ren, ZW; Niu, ZC
刊名applied physics letters ; APPLIED PHYSICS LETTERS
出版日期2014 ; 2014
卷号104期号:5页码:052111
学科主题半导体物理 ; 半导体物理
收录类别SCI
语种英语 ; 英语
公开日期2015-03-19 ; 2015-03-19
源URL[http://ir.semi.ac.cn/handle/172111/26013]  
专题半导体研究所_半导体超晶格国家重点实验室
推荐引用方式
GB/T 7714
Wang, J,Xing, JL,Xiang, W,et al. Investigation of high hole mobility In0.41Ga0.59Sb/Al0.91Ga0.09Sb quantum well structures grown by molecular beam epitaxy, Investigation of high hole mobility In0.41Ga0.59Sb/Al0.91Ga0.09Sb quantum well structures grown by molecular beam epitaxy[J]. applied physics letters, APPLIED PHYSICS LETTERS,2014, 2014,104, 104(5):052111, 052111.
APA Wang, J.,Xing, JL.,Xiang, W.,Wang, GW.,Xu, YQ.,...&Niu, ZC.(2014).Investigation of high hole mobility In0.41Ga0.59Sb/Al0.91Ga0.09Sb quantum well structures grown by molecular beam epitaxy.applied physics letters,104(5),052111.
MLA Wang, J,et al."Investigation of high hole mobility In0.41Ga0.59Sb/Al0.91Ga0.09Sb quantum well structures grown by molecular beam epitaxy".applied physics letters 104.5(2014):052111.

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来源:半导体研究所

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