中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Numerical simulation of two-dimensional electron gas characteristics of a novel (InxAl1-xN/AlN)MQWs/GaN high electron mobility transistor

文献类型:期刊论文

作者Li, W ; Wang, XL ; Qu, SQ ; Wang, Q ; Xiao, HL ; Wang, CM ; Peng, EC ; Hou, X ; Wang, ZG
刊名journal of alloys and compounds
出版日期2014
卷号605页码:113-117
学科主题半导体材料
收录类别SCI
语种英语
公开日期2015-03-25
源URL[http://ir.semi.ac.cn/handle/172111/26226]  
专题半导体研究所_中科院半导体材料科学重点实验室
推荐引用方式
GB/T 7714
Li, W,Wang, XL,Qu, SQ,et al. Numerical simulation of two-dimensional electron gas characteristics of a novel (InxAl1-xN/AlN)MQWs/GaN high electron mobility transistor[J]. journal of alloys and compounds,2014,605:113-117.
APA Li, W.,Wang, XL.,Qu, SQ.,Wang, Q.,Xiao, HL.,...&Wang, ZG.(2014).Numerical simulation of two-dimensional electron gas characteristics of a novel (InxAl1-xN/AlN)MQWs/GaN high electron mobility transistor.journal of alloys and compounds,605,113-117.
MLA Li, W,et al."Numerical simulation of two-dimensional electron gas characteristics of a novel (InxAl1-xN/AlN)MQWs/GaN high electron mobility transistor".journal of alloys and compounds 605(2014):113-117.

入库方式: OAI收割

来源:半导体研究所

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