中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Effects of Rapid Thermal Process Temperatures on Strain and Si Concentration Distributions in Ge-on-Insulator Structures Formed by Rapid Melt Growth

文献类型:期刊论文

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作者Wen, JJ; Zhang, DL; Liu, Z; Zhou, TW; Xue, CL; Zuo, YH; Li, CB; Wang, QM; Cheng, BW
刊名ecs solid state letters ; ECS SOLID STATE LETTERS
出版日期2014 ; 2014
卷号3期号:7页码:q33-q35
学科主题光电子学 ; 光电子学
收录类别SCI
语种英语 ; 英语
公开日期2015-05-11 ; 2015-05-11
源URL[http://ir.semi.ac.cn/handle/172111/26441]  
专题半导体研究所_光电子研究发展中心
推荐引用方式
GB/T 7714
Wen, JJ,Zhang, DL,Liu, Z,et al. Effects of Rapid Thermal Process Temperatures on Strain and Si Concentration Distributions in Ge-on-Insulator Structures Formed by Rapid Melt Growth, Effects of Rapid Thermal Process Temperatures on Strain and Si Concentration Distributions in Ge-on-Insulator Structures Formed by Rapid Melt Growth[J]. ecs solid state letters, ECS SOLID STATE LETTERS,2014, 2014,3, 3(7):q33-q35, Q33-Q35.
APA Wen, JJ.,Zhang, DL.,Liu, Z.,Zhou, TW.,Xue, CL.,...&Cheng, BW.(2014).Effects of Rapid Thermal Process Temperatures on Strain and Si Concentration Distributions in Ge-on-Insulator Structures Formed by Rapid Melt Growth.ecs solid state letters,3(7),q33-q35.
MLA Wen, JJ,et al."Effects of Rapid Thermal Process Temperatures on Strain and Si Concentration Distributions in Ge-on-Insulator Structures Formed by Rapid Melt Growth".ecs solid state letters 3.7(2014):q33-q35.

入库方式: OAI收割

来源:半导体研究所

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