中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Defect reduction in semipolar {10over-barover-bar} GaN grown on m-sapphire via two-step nanoepitaxial lateral overgrowth

文献类型:期刊论文

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作者Yang, JK; Wei, TB; Huo, ZQ; Zhang, YH; Hu, Q; Wei, XC; Sun, BJ; Duan, RF; Wang, JX
刊名crystengcomm ; CRYSTENGCOMM
出版日期2014 ; 2014
卷号16期号:21页码:4562-4567
学科主题半导体器件 ; 半导体器件
收录类别SCI
语种英语 ; 英语
公开日期2015-05-11 ; 2015-05-11
源URL[http://ir.semi.ac.cn/handle/172111/26439]  
专题半导体研究所_中科院半导体照明研发中心
推荐引用方式
GB/T 7714
Yang, JK,Wei, TB,Huo, ZQ,et al. Defect reduction in semipolar {10over-barover-bar} GaN grown on m-sapphire via two-step nanoepitaxial lateral overgrowth, Defect reduction in semipolar {10over-barover-bar} GaN grown on m-sapphire via two-step nanoepitaxial lateral overgrowth[J]. crystengcomm, CRYSTENGCOMM,2014, 2014,16, 16(21):4562-4567, 4562-4567.
APA Yang, JK.,Wei, TB.,Huo, ZQ.,Zhang, YH.,Hu, Q.,...&Wang, JX.(2014).Defect reduction in semipolar {10over-barover-bar} GaN grown on m-sapphire via two-step nanoepitaxial lateral overgrowth.crystengcomm,16(21),4562-4567.
MLA Yang, JK,et al."Defect reduction in semipolar {10over-barover-bar} GaN grown on m-sapphire via two-step nanoepitaxial lateral overgrowth".crystengcomm 16.21(2014):4562-4567.

入库方式: OAI收割

来源:半导体研究所

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