Low energy Cu clusters slow deposition on a Fe (001) surface investigated by molecular dynamics simulation
文献类型:期刊论文
作者 | Zhang, SX ; Gong, HF ; Chen, XZ ; Li, GP ; Wang, ZG |
刊名 | APPLIED SURFACE SCIENCE
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出版日期 | 2014 |
卷号 | 314页码:433—442 |
关键词 | CU/FE/CU/SI(111) ULTRATHIN FILMS COMPUTER-SIMULATION COPPER CLUSTERS MAGNETIC-PROPERTIES BEAM DEPOSITION CONTACT EPITAXY THIN-FILMS MULTILAYERS SUBSTRATE GROWTH |
ISSN号 | 0169-4332 |
通讯作者 | ligp@lzu.edu.cn ; zhgwang@impcas.ac.cn |
英文摘要 | The slow deposition of low energy Cu clusters on a Fe (001) surface was investigated by molecular dynamics simulation. A many-body potential based on Finnis-Sinclair model was used to describe the interactions among atoms. Three clusters comprising of 13, 55 and 147 atoms, respectively, were deposited with incident energies ranging from 0.0 to 1.0 eV/atom at various substrate temperatures (0, 300 and 800 K). The rearrangement and the diffusion of cluster can occur, only when the cluster atoms are activated and obtained enough migration energy. The interaction between low energy cluster and substrate can be divided to the landing and the thermal diffusion phases. In the former, the migration energy originates from the latent heat of binding energy for the soft deposition regime and primarily comes from the incident energy of cluster for the energetic cluster deposition regime. In the latter, the thermal vibration would result in some cluster atoms activated again at medium and high substrate temperatures. Also, the effects of incident energy, cluster size and substrate temperature on the interaction potential energy between cluster and substrate, the final deposition morphology of cluster, the spreading index and the structure parameter of cluster are analyzed. (C) 2014 Elsevier B.V. All rights reserved. |
收录类别 | SCI |
语种 | 英语 |
WOS记录号 | WOS:000341464100058 |
公开日期 | 2015-03-13 |
源URL | [http://ir.sinap.ac.cn/handle/331007/14230] ![]() |
专题 | 上海应用物理研究所_中科院上海应用物理研究所2011-2017年 |
推荐引用方式 GB/T 7714 | Zhang, SX,Gong, HF,Chen, XZ,et al. Low energy Cu clusters slow deposition on a Fe (001) surface investigated by molecular dynamics simulation[J]. APPLIED SURFACE SCIENCE,2014,314:433—442. |
APA | Zhang, SX,Gong, HF,Chen, XZ,Li, GP,&Wang, ZG.(2014).Low energy Cu clusters slow deposition on a Fe (001) surface investigated by molecular dynamics simulation.APPLIED SURFACE SCIENCE,314,433—442. |
MLA | Zhang, SX,et al."Low energy Cu clusters slow deposition on a Fe (001) surface investigated by molecular dynamics simulation".APPLIED SURFACE SCIENCE 314(2014):433—442. |
入库方式: OAI收割
来源:上海应用物理研究所
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