Mechanism of force mode dip-pen nanolithography
文献类型：期刊论文
| 作者 | Yang, HJ ; Xie, H ; Wu, HX ; Rong, WB ; Sun, LN ; Guo, SW ; Wang, HB |
| 刊名 | JOURNAL OF APPLIED PHYSICS
 |
| 出版日期 | 2014 |
| 卷号 | 115期号:17 |
| 关键词 | CAPILLARY FORCES TAPPING MODE LITHOGRAPHY FABRICATION OLIGONUCLEOTIDES MICROSCOPY MOLECULES PROTEINS SILVER INK |
| ISSN号 | 0021-8979 |
| 通讯作者 | yanghaijun@sinap.ac.cn ; swguo@sjtu.edu.cn ; wanghuabin@cigit.ac.cn |
| 英文摘要 | In this work, the underlying mechanism of the force mode dip-pen nanolithography (FMDPN) is investigated in depth by analyzing force curves, tapping mode deflection signals, and "Z-scan" voltage variations during the FMDPN. The operation parameters including the relative "trigger threshold" and "surface delay" parameters are vital to control the loading force and dwell time for ink deposition during FMDPN. A model is also developed to simulate the interactions between the atomic force microscope tip and soft substrate during FMDPN, and verified by its good performance in fitting our experimental data. (C) 2014 AIP Publishing LLC. |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000335643700645 |
| 公开日期 | 2015-03-13 |
| 源URL | [http://ir.sinap.ac.cn/handle/331007/14286]  |
| 专题 | 上海应用物理研究所_中科院上海应用物理研究所2011-2017年 |
| 推荐引用方式 GB/T 7714 | Yang, HJ,Xie, H,Wu, HX,et al. Mechanism of force mode dip-pen nanolithography[J]. JOURNAL OF APPLIED PHYSICS,2014,115(17). |
| APA | Yang, HJ.,Xie, H.,Wu, HX.,Rong, WB.,Sun, LN.,...&Wang, HB.(2014).Mechanism of force mode dip-pen nanolithography.JOURNAL OF APPLIED PHYSICS,115(17). |
| MLA | Yang, HJ,et al."Mechanism of force mode dip-pen nanolithography".JOURNAL OF APPLIED PHYSICS 115.17(2014). |
入库方式： OAI收割
来源：上海应用物理研究所
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