Outgassing analysis of molecular glass photoresists under EUV irradiation
文献类型：期刊论文
| 作者 | Chen, L ; Xu, J ; Yuan, H ; Yang, SM ; Wang, LS ; Wu, YQ ; Zhao, J ; Chen, M ; Liu, HG ; Li, SY ; Tai, RZ ; Wang, SQ ; Yang, GQ |
| 刊名 | SCIENCE CHINA-CHEMISTRY
 |
| 出版日期 | 2014 |
| 卷号 | 57期号:12页码:1746—1750 |
| 关键词 | LITHOGRAPHY |
| ISSN号 | 1674-7291 |
| 通讯作者 | g1704@iccas.ac.cn ; gqyang@iccas.ac.cn |
| 英文摘要 | A device was designed and assembled to analyze the outgassing of molecular glass (MG) photoresists under extreme ultraviolet (EUV) exposure. The outgassing of the photoresists with different components and different concentrations of tert-butoxycarbonyl (t-Boc), photo-generated acid (PAG), and acid quencher was systematically investigated. Based on experiments, some solutions for reducing the outgassing of MG photoresists were proposed. |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000346047500018 |
| 公开日期 | 2015-03-13 |
| 源URL | [http://ir.sinap.ac.cn/handle/331007/14296]  |
| 专题 | 上海应用物理研究所_中科院上海应用物理研究所2011-2017年 |
| 推荐引用方式 GB/T 7714 | Chen, L,Xu, J,Yuan, H,et al. Outgassing analysis of molecular glass photoresists under EUV irradiation[J]. SCIENCE CHINA-CHEMISTRY,2014,57(12):1746—1750. |
| APA | Chen, L.,Xu, J.,Yuan, H.,Yang, SM.,Wang, LS.,...&Yang, GQ.(2014).Outgassing analysis of molecular glass photoresists under EUV irradiation.SCIENCE CHINA-CHEMISTRY,57(12),1746—1750. |
| MLA | Chen, L,et al."Outgassing analysis of molecular glass photoresists under EUV irradiation".SCIENCE CHINA-CHEMISTRY 57.12(2014):1746—1750. |
入库方式： OAI收割
来源：上海应用物理研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。