Tuning the Band Gap in Silicene by Oxidation
文献类型：期刊论文
| 作者 | Du, Y ; Zhuang, JC ; Liu, HS ; Xu, X ; Eilers, S ; Wu, KH ; Cheng, P ; Zhao, JJ ; Pi, XD ; See, KW ; Peleckis, G ; Wang, XL ; Dou, SX |
| 刊名 | ACS NANO
 |
| 出版日期 | 2014 |
| 卷号 | 8期号:10页码:10019 |
| 关键词 | silicene oxidation band gap STM DFT calculation |
| ISSN号 | 1936-0851 |
| 通讯作者 | Du, Y (reprint author), Univ Wollongong, ISEM, Wollongong, NSW 2525, Australia. |
| 中文摘要 | Silicene monolayers grown on Ag(111) surfaces demonstrate a band gap that is tunable by oxygen adatoms from semimetallic to semiconducting type. With the use of low-temperature scanning tunneling microscopy, we find that the adsorption configurations and amounts of oxygen adatoms on the silicene surface are critical for band gap engineering, which is dominated by different buckled structures in root 13 x root 13, 4 x 4, and 2 root 3 x 2 root 3 silicene layers. The Si-O-Si bonds are the most energy-favored species formed on root 13 x root 13, 4 x 4, and 2 root 3 x 2 root 3 structures under oxidation, which is verified by in situ Raman spectroscopy as well as first-principles calculations. The silicene monolayers retain their structures when fully covered by oxygen adatoms. Our work demonstrates the feasibility of tuning the band gap of silicene with oxygen adatoms, which, in turn, expands the base of available two-dimensional electronic materials for devices with properties that is hardly achieved with graphene oxide. |
| 资助信息 | Australian Research Council (ARC) [DP 140102581]; Australian Research Council (ARC) through Linkage, Infrastructure, Equipment and Facilities (LIEF) [LE100100081, LE110100099]; National Natural Science Foundation of China [11134005]; University of Wollongong; University Research Council (URC) |
| 语种 | 英语 |
| 公开日期 | 2015-04-14 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/58790]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Du, Y,Zhuang, JC,Liu, HS,et al. Tuning the Band Gap in Silicene by Oxidation[J]. ACS NANO,2014,8(10):10019. |
| APA | Du, Y.,Zhuang, JC.,Liu, HS.,Xu, X.,Eilers, S.,...&Dou, SX.(2014).Tuning the Band Gap in Silicene by Oxidation.ACS NANO,8(10),10019. |
| MLA | Du, Y,et al."Tuning the Band Gap in Silicene by Oxidation".ACS NANO 8.10(2014):10019. |
入库方式： OAI收割
来源：物理研究所
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