中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Electrical spin injection into InGaAs/GaAs quantum wells: A comparison between MgO tunnel barriers grown by sputtering and molecular beam epitaxy methods

文献类型:期刊论文

作者Barate, P ; Liang, S ; Zhang, TT ; Frougier, J ; Vidal, M ; Renucci, P ; Devaux, X ; Xu, B ; Jaffres, H ; George, JM ; Marie, X ; Hehn, M ; Mangin, S ; Zheng, Y ; Amand, T ; Tao, B ; Han, XF ; Wang, Z ; Lu, Y
刊名APPLIED PHYSICS LETTERS
出版日期2014
卷号105期号:1
ISSN号0003-6951
通讯作者Lu, Y (reprint author), CNRS Nancy Univ, Inst Jean Lamour, UMR 7198, BP 239, F-54506 Vandoeuvre Les Nancy, France.
中文摘要An efficient electrical spin injection into an InGaAs/GaAs quantum well light emitting diode is demonstrated thanks to a CoFeB/MgO spin injector. The textured MgO tunnel barrier is fabricated by two different techniques: sputtering and molecular beam epitaxy. The maximal spin injection efficiency is comparable for both methods. Additionally, the effect of annealing is also investigated for the two types of samples. Both samples show the same trend: an increase of the electroluminescence circular polarization (P-c) with the increase of annealing temperature, followed by a saturation of P-c beyond 350 degrees C annealing. Since the increase of P-c starts well below the crystallization temperature of the full CoFeB bulk layer, this trend could be mainly due to an improvement of chemical structure at the top CoFeB/MgO interface. This study reveals that the control of CoFeB/MgO interface is essential for an optimal spin injection into semiconductor. (C) 2014 AIP Publishing LLC.
资助信息France-China ANR-NSFC research project SISTER [ANR-11-IS10-0001, NNSFC 61161130527]; French ANR research project INSPIRE [ANR-10-BLAN-1014]; Chinese State Key Project of Fundamental Research of Ministry of Science and Technology (MOST) [2010CB934401]
语种英语
公开日期2015-04-14
源URL[http://ir.iphy.ac.cn/handle/311004/58900]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式
GB/T 7714
Barate, P,Liang, S,Zhang, TT,et al. Electrical spin injection into InGaAs/GaAs quantum wells: A comparison between MgO tunnel barriers grown by sputtering and molecular beam epitaxy methods[J]. APPLIED PHYSICS LETTERS,2014,105(1).
APA Barate, P.,Liang, S.,Zhang, TT.,Frougier, J.,Vidal, M.,...&Lu, Y.(2014).Electrical spin injection into InGaAs/GaAs quantum wells: A comparison between MgO tunnel barriers grown by sputtering and molecular beam epitaxy methods.APPLIED PHYSICS LETTERS,105(1).
MLA Barate, P,et al."Electrical spin injection into InGaAs/GaAs quantum wells: A comparison between MgO tunnel barriers grown by sputtering and molecular beam epitaxy methods".APPLIED PHYSICS LETTERS 105.1(2014).

入库方式: OAI收割

来源:物理研究所

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