Fabrication of 2-inch nano patterned sapphire substrate with high uniformity by two-beam laser interference lithography
文献类型：期刊论文
| 作者 | Dai, LG ; Yang, F ; Yue, G ; Jiang, Y ; Jia, HQ ; Wang, WX ; Chen, H |
| 刊名 | NANOPHOTONICS AND MICRO/NANO OPTICS II
 |
| 出版日期 | 2014 |
| 卷号 | 9277 |
| 关键词 | Laser interference lithography nano-scale patterned sapphire substrate large area high uniformity |
| ISSN号 | 0277-786X |
| 通讯作者 | Dai, LG (reprint author), Chinese Acad Sci, Beijing Key Lab New Energy Mat & Devices, Beijing Natl Lab Condensed Matter Phys, Key Lab Renewable Energy,Inst Phys, Beijing 100190, Peoples R China. |
| 中文摘要 | Generally, nano-scale patterned sapphire substrate (NPSS) has better performance than micro-scale patterned sapphire substrate (MPSS) in improving the light extraction efficiency of LEDs. Laser interference lithography (LIL) is one of the powerful fabrication methods for periodic nanostructures without photo-masks for different designs. However, Lloyd's mirror LIL system has the disadvantage that fabricated patterns are inevitably distorted, especially for large-area twodimensional (2D) periodic nanostructures. Herein, we introduce two-beam LIL system to fabricate consistent large-area NPSS. Quantitative analysis and characterization indicate that the high uniformity of the photoresist arrays is achieved. Through the combination of dry etching and wet etching techniques, the well-defined NPSS with period of 460 nm were prepared on the whole sapphire substrate. The deviation is 4.34% for the bottom width of the triangle truncated pyramid arrays on the whole 2-inch sapphire substrate, which is suitable for the application in industrial production of NPSS. |
| 语种 | 英语 |
| 公开日期 | 2015-04-14 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/59349]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Dai, LG,Yang, F,Yue, G,et al. Fabrication of 2-inch nano patterned sapphire substrate with high uniformity by two-beam laser interference lithography[J]. NANOPHOTONICS AND MICRO/NANO OPTICS II,2014,9277. |
| APA | Dai, LG.,Yang, F.,Yue, G.,Jiang, Y.,Jia, HQ.,...&Chen, H.(2014).Fabrication of 2-inch nano patterned sapphire substrate with high uniformity by two-beam laser interference lithography.NANOPHOTONICS AND MICRO/NANO OPTICS II,9277. |
| MLA | Dai, LG,et al."Fabrication of 2-inch nano patterned sapphire substrate with high uniformity by two-beam laser interference lithography".NANOPHOTONICS AND MICRO/NANO OPTICS II 9277(2014). |
入库方式： OAI收割
来源：物理研究所
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